Dr. Richard L. Lozes
Principal Consultant at Lozes Technology Consulting
Publications (2)

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Modulation, Calibration, Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Chemically amplified resists

PROCEEDINGS ARTICLE | July 1, 1991
Proc. SPIE. 1464, Integrated Circuit Metrology, Inspection, and Process Control V
KEYWORDS: Electron beam lithography, Reticles, Metrology, Inspection, Process control, Photomasks, Integrated circuits, Photomicroscopy, Overlay metrology, Phase shifts

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