Richard Oleksak
at Oregon State Univ
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Oxides, Thin films, Lithography, Electron beam lithography, Electron beams, Metals, Electrons, Transmission electron microscopy, Line width roughness, Hafnium

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