Dr. Richard D. Peters
Engineering Research Staff at
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Optical lithography, Etching, Chemistry, 3D modeling, Photoresist materials, Optical proximity correction, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Semiconductors, Chemical species, Ions, Silicon, Photoresist materials, Ion implantation, Boron, Phosphorus, Fluorine, Semiconducting wafers

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Reticles, Logic, Etching, Manufacturing, Inspection, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Semiconductors, Optical lithography, Polymers, Scanning electron microscopy, Thermal effects, Cadmium sulfide, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Reticles, Quartz, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Binary data, Resolution enhancement technologies, Phase shifts

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Reticles, Quartz, Image processing, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Mask making, Resolution enhancement technologies, Phase shifts

Showing 5 of 15 publications
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