Dr. Richard Quintanilha
Researcher at
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Microscopes, Beam splitters, Metrology, Calibration, Microscopy, Optical testing, Objectives, Charge-coupled devices, Scatter measurement, Combined lens-mirror systems

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Metrology, Finite-difference time-domain method, Defect detection, Polarization, 3D modeling, Neodymium, Semiconducting wafers, Illumination engineering, Defect inspection

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Microscopes, Metrology, Polarization, Calibration, Quartz, Ultraviolet radiation, Photomasks, Charge-coupled devices, Standards development

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Microscopes, Metrology, Calibration, Ultraviolet radiation, Microscopy, Atomic force microscopy, Scanning electron microscopy, Photomasks, Critical dimension metrology, Standards development

PROCEEDINGS ARTICLE | August 24, 2009
Proc. SPIE. 7405, Instrumentation, Metrology, and Standards for Nanomanufacturing III
KEYWORDS: Semiconductors, Microscopes, Metrology, Microscopy, Objectives, Excimer lasers, Critical dimension metrology, Geometrical optics, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | June 29, 2009
Proc. SPIE. 7390, Modeling Aspects in Optical Metrology II
KEYWORDS: Oxides, Microscopes, Diffraction, Polarization, Microscopy, Silicon, Finite element methods, Charge-coupled devices, Critical dimension metrology, Illumination engineering

Showing 5 of 11 publications
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