Dr. Richard Schenker
at Intel Corp
SPIE Involvement:
Senior status | Author
Publications (17)

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Copper, Dielectrics, Chemistry, Process control, Critical dimension metrology, Plasma

PROCEEDINGS ARTICLE | April 3, 2010
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Optical lithography, Cadmium, Metals, Glasses, Design for manufacturing, Photomasks, SRAF, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Electron beam lithography, Optical lithography, Etching, Glasses, Image resolution, Chromium, 3D modeling, Photomasks, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Cadmium, Modulation, Etching, Glasses, Image transmission, Photomasks, SRAF, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Imaging systems, Glasses, Near field, Projection systems, Image transmission, Photomasks, Mask making, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Finite-difference time-domain method, Optical lithography, Silica, Glasses, Diffusion, Chromium, Printing, Photomasks, Semiconducting wafers, Binary data

Showing 5 of 17 publications
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