Dr. Richard Schenker
Intel Fellow, Director Novel Patterning at Intel Corp
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Copper, Dielectrics, Chemistry, Process control, Critical dimension metrology, Plasma

Proceedings Article | 3 April 2010 Paper
Proc. SPIE. 7641, Design for Manufacturability through Design-Process Integration IV
KEYWORDS: Lithography, Optical lithography, Cadmium, Metals, Glasses, Design for manufacturing, Photomasks, SRAF, Semiconducting wafers, Phase shifts

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Electron beam lithography, Optical lithography, Etching, Glasses, Image resolution, Chromium, 3D modeling, Photomasks, Semiconducting wafers, Defect inspection

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Cadmium, Modulation, Etching, Glasses, Image transmission, Photomasks, SRAF, Semiconducting wafers, Phase shifts

Proceedings Article | 7 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Imaging systems, Glasses, Near field, Projection systems, Image transmission, Photomasks, Mask making, Semiconducting wafers, Resolution enhancement technologies

Showing 5 of 17 publications
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