Dr. Richard M. Silver
Physicist / Div Leader at National Institute of Standards and Technology
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Co-Chair | Conference Chair | Journal Editorial Board Member | Author | Editor
Publications (82)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Finite-difference time-domain method, Defect detection, Ultraviolet radiation, Inspection, Interference (communication), Line edge roughness, Semiconducting wafers, Ultraviolet detectors, Defect inspection

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Thin films, Metrology, Chemical species, Dielectrics, Optical testing, Scatterometry, Measurement devices, Scatter measurement, Electromagnetism

PROCEEDINGS ARTICLE | November 8, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Microscopes, Metrology, Polarization, Microscopy, Light scattering, Optical metrology, Objectives, Photomasks, Beam shaping, Illumination engineering

SPIE Conference Volume | July 27, 2017

PROCEEDINGS ARTICLE | June 26, 2017
Proc. SPIE. 10330, Modeling Aspects in Optical Metrology VI
KEYWORDS: Semiconductors, Signal to noise ratio, Metrology, Finite-difference time-domain method, Optical lithography, Defect detection, Deep ultraviolet, Polarization, Scattering, Ultraviolet radiation, Light scattering, Inspection, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Signal to noise ratio, Finite-difference time-domain method, Optical spheres, Defect detection, Polarization, Scattering, Silicon, Bridges, Extreme ultraviolet, Defect inspection

Showing 5 of 82 publications
Conference Committee Involvement (25)
Metrology, Inspection, and Process Control for Microlithography XXXIII
24 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXX
22 February 2016 | San Jose, California, United States
Showing 5 of 25 published special sections
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