Dr. Richard M. Silver
Physicist / Div Leader at National Institute of Standards and Technology
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Co-Chair | Conference Chair | Journal Editorial Board Member | Author | Editor
Publications (85)

Proceedings Article | 21 June 2019
Proc. SPIE. 11057, Modeling Aspects in Optical Metrology VII
KEYWORDS: Metrology, Data modeling, Dielectrics, Electrons, Silicon, Reflectivity, Reflectometry, Electromagnetism, Anisotropy

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Defect detection, Convolutional neural networks, Data modeling, Scattering, Inspection, Machine learning, Semiconducting wafers, Performance modeling, Defect inspection

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Semiconductors, Metrology, Chemical species, Silicon, Manufacturing, Physics, Transmission electron microscopy, Quantum information, Quantum communications, Quantum computing

Proceedings Article | 19 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Thin films, Metrology, Chemical species, Dielectrics, Optical testing, Scatterometry, Measurement devices, Scatter measurement, Electromagnetism

Proceedings Article | 19 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Finite-difference time-domain method, Defect detection, Ultraviolet radiation, Inspection, Interference (communication), Line edge roughness, Semiconducting wafers, Ultraviolet detectors, Defect inspection

Proceedings Article | 8 November 2017
Proc. SPIE. 10451, Photomask Technology 2017
KEYWORDS: Microscopes, Metrology, Polarization, Microscopy, Light scattering, Optical metrology, Objectives, Photomasks, Beam shaping, Illumination engineering

Showing 5 of 85 publications
Conference Committee Involvement (27)
Metrology, Inspection, and Process Control for Microlithography XXXIV
23 February 2020 | San Jose, California, United States
Modeling Aspects in Optical Metrology VII
24 June 2019 | Munich, Germany
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Showing 5 of 27 published special sections
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top