Dr. Richard E. Wistrom
Process Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Polymers, Chemistry, Oxygen, Process control, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing, Photomask technology

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electrons, Manufacturing, Inspection, Image resolution, Photomasks, Extreme ultraviolet, SRAF, Line edge roughness, EUV optics

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Logic, Opacity, Etching, Inspection, Chromium, Attenuators, Photomasks, SRAF, Phase shifts

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Printing, Transmittance, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Phase modulation, Opacity, Etching, Chromium, Process control, Photomasks, Critical dimension metrology, Line edge roughness, Photoresist processing, Phase shifts

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Data modeling, Etching, Quartz, Chromium, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Photomasks, Plasma

Showing 5 of 16 publications
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