Dr. Richard E. Wistrom
Process Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Oxygen, Process control, Chemistry, Polymers, Extreme ultraviolet lithography, Photoresist processing, High volume manufacturing, Etching, Extreme ultraviolet, Photomasks, Photomask technology

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photomasks, Line edge roughness, Electron beam lithography, Electrons, SRAF, Extreme ultraviolet, Image resolution, EUV optics, Inspection, Manufacturing

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Phase shifts, Logic, Lithography, Chromium, Inspection, Opacity, SRAF, Etching, Attenuators

Proceedings Article | 1 April 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Lithography, Transmittance, Resolution enhancement technologies, Printing, SRAF, Critical dimension metrology, Phase shifts

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Etching, Photomasks, Opacity, Chromium, Critical dimension metrology, Process control, Phase shifts, Photoresist processing, Line edge roughness, Phase modulation

Showing 5 of 16 publications
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