Richard Y. Yang
YTS Director at KLA-Tencor Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Reticles, Metals, Manufacturing, Inspection, Scanning electron microscopy, Wafer inspection, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | August 27, 1999
Proc. SPIE. 3884, In-Line Methods and Monitors for Process and Yield Improvement
KEYWORDS: Etching, Metals, Silicon, Inspection, Laser scattering, Inspection equipment, Plasma etching, Photoresist processing, Semiconducting wafers, Plasma

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