Richer Yang
at Inotera Memories Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 28 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Metrology, 3D modeling, Scanning electron microscopy, 3D metrology, Finite element methods, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Yield improvement

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Metrology, Manufacturing, 3D modeling, Finite element methods, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Neodymium, Overlay metrology, Personal protective equipment

Proceedings Article | 12 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Scanners, Distortion, Capacitance, Optical alignment, Semiconducting wafers, Yield improvement, Overlay metrology, Front end of line, Current controlled current source

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Etching, Scanners, Time metrology, Optical alignment, Semiconducting wafers, Yield improvement, Samarium, Overlay metrology, Current controlled current source

Showing 5 of 6 publications
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