Dr. Rick Kneedler
at FEI Co
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Metrology, Sensors, Scanners, Microscopy, Atomic force microscopy, Precision measurement, 3D metrology, Photomasks, Critical dimension metrology, Edge roughness

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