Rigo Richter
at Carl Zeiss SMT GmbH
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 27 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Image processing, Error analysis, Manufacturing, Reliability, Inspection, Image analysis, Photomasks, Semiconducting wafers, Standards development

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Image processing, Error analysis, Manufacturing, Image analysis, Photomasks, Analytical research, Critical dimension metrology, Semiconducting wafers, Tolerancing, Standards development

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Lithographic illumination, Scanners, Photomasks, Double patterning technology, Source mask optimization, Computational lithography, Optical aberrations, Semiconducting wafers, 193nm lithography

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Cadmium, Seaborgium, Scanners, Error analysis, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Metrology, Error analysis, Manufacturing, Image analysis, Photomasks, Analytical research, Critical dimension metrology, Semiconducting wafers, Standards development

Showing 5 of 14 publications
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