Dr. Rik Jonckheere
Senior Researcher Reticle Technology at imec
SPIE Involvement:
Author
Publications (85)

Proceedings Article | 28 December 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Photomasks, Stochastic processes, Printing, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, Extreme ultraviolet, Manufacturing, Reticles, Nanoimprint lithography

Proceedings Article | 4 November 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Ruthenium, Scanners, Contamination, Integrated circuits, Semiconductors, X-rays

Proceedings Article | 24 October 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Defect detection, Defect inspection, Stochastic processes, Photomasks, Failure analysis, Extreme ultraviolet, Printing, Critical dimension metrology, Extreme ultraviolet lithography

Proceedings Article | 29 August 2019 Paper
Proc. SPIE. 11177, 35th European Mask and Lithography Conference (EMLC 2019)
KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers, High volume manufacturing, Critical dimension metrology, Inspection, Logic

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Scanners, Reflectivity, Oxidation, Ruthenium

Showing 5 of 85 publications
Conference Committee Involvement (9)
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Photomask Technology
19 September 2011 | Monterey, California, United States
Showing 5 of 9 Conference Committees
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