Riki Ogawa
at Advanced Mask Inspection Technology Inc
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Inspection, Image sensors, Image transmission, Photomasks, Extreme ultraviolet, Double patterning technology

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Defect detection, Inspection, Image sensors, Photomasks, Extreme ultraviolet, Image enhancement, Extreme ultraviolet lithography, Image contrast enhancement, Signal detection

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Super resolution, Defect detection, Polarization, Inspection, Optical inspection, Image transmission, Photomasks, Image contrast enhancement, 193nm lithography

PROCEEDINGS ARTICLE | November 1, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Microscopes, Diffraction, Prisms, Phase shifting, Polarization, Inspection, Image quality, Photomasks, Digital image correlation, Phase shifts

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Diffraction, Optical design, Phase shifting, Glasses, Inspection, Chromium, Optical inspection, Photomasks, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Defect detection, Sensors, Inspection, Image acquisition, Optical inspection, Image transmission, Photomasks, 193nm lithography, Defect inspection

Showing 5 of 9 publications
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