Mr. Rikon Chao Profile

Rikon Chao

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Publications (3)

Proceedings Article | 28 July 2014 Paper

Extreme ultraviolet mask roughness: requirements, characterization, and modeling

Patrick Naulleau, Suchit Bhattaria, Rick Chao, Rene Claus, Kenneth Goldberg, Frank Goodwin, Eric Gullikson, Donggun Lee, Andy Neureuther, Jong-Ju Park

Proceedings Volume 9256, 92560J (2014) https://doi.org/10.1117/12.2070303

KEYWORDS: Photomasks, Extreme ultraviolet, Speckle, Line width roughness, Inspection, Atomic force microscopy, Lithography, Scattering, Scatter measurement, Line edge roughness

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Proceedings Article | 23 September 2013 Paper

EUV scatterometry-based measurement method for the determination of phase roughness

Rikon Chao, Eric Gullikson, Michael Goldstein, Frank Goodwin, Ranganath Teki, Andy Neureuther, Patrick Naulleau

Proceedings Volume 8880, 88801B (2013) https://doi.org/10.1117/12.2027695

KEYWORDS: Scatterometry, Photomasks, Extreme ultraviolet, Atomic force microscopy, Multilayers, Scatter measurement, Reflectivity, Coating, Surface roughness, Scattering

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Proceedings Article | 1 April 2013 Paper

Experimental verification of EUV mask limitations at high numerical apertures

Rikon Chao, Paul Graeupner, Eric Gullikson, Seong-Sue Kim, Jens-Timo Neumann, Ryan Miyakawa, Hwan-Seok Seo, Andy Neureuther, Patrick Naulleau

Proceedings Volume 8679, 86791M (2013) https://doi.org/10.1117/12.2013209

KEYWORDS: Data modeling, Reflectivity, Diffraction, Photomasks, Scatter measurement, Calibration, Extreme ultraviolet, Molybdenum, Silicon, Ruthenium

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