Rikon Chao
at
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Lithography, Speckle, Scattering, Inspection, Atomic force microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Line edge roughness, Scatter measurement

PROCEEDINGS ARTICLE | September 23, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Multilayers, Scattering, Coating, Reflectivity, Surface roughness, Atomic force microscopy, Scatterometry, Photomasks, Extreme ultraviolet, Scatter measurement

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Diffraction, Data modeling, Calibration, Silicon, Reflectivity, Photomasks, Extreme ultraviolet, Molybdenum, Scatter measurement, Ruthenium

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