Mr. Rituraj Singh Rathore
at National Institute of Technology Hamirpur
SPIE Involvement:
Author
Publications (2)

SPIE Journal Paper | March 19, 2018
JM3 Vol. 17 Issue 01
KEYWORDS: Fin field effect transistors, Line edge roughness, Doping, Optical lithography, Transistors, Computer simulations, Field effect transistors, Line width roughness, CMOS technology, Device simulation

SPIE Journal Paper | February 16, 2017
JM3 Vol. 16 Issue 01
KEYWORDS: Field effect transistors, Fin field effect transitor, Line edge roughness, Optical lithography, Doping, Metals, Oxides, Tin, Statistical analysis, Calibration

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top