Unspecified Robert M. H. Rompelberg Profile

Robert M. H. Rompelberg

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Proceedings Article | 22 February 2021 Poster + Paper

Plasma assisted particle contamination control: plasma charging dependence on particle morphology

J. C. A. van Huijstee, B. van Minderhout, R. M. H. Rompelberg, P. Blom, T. Peijnenburg, J. Beckers

Proceedings Volume 11611, 116113A (2021) https://doi.org/10.1117/12.2584607

KEYWORDS: Plasma, Particles, Contamination control, Particle contamination, Semiconductors, Extreme ultraviolet lithography, Contamination, Spherical lenses, Scanners, Robotics

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