Dr. Robert F. Berg
at National Institute of Standards and Technology
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Electron beams, Contamination, Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Semiconducting wafers, Standards development, Temperature metrology

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Carbon, Mirrors, Contamination, Scanners, Molecules, Manufacturing, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

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