Robert Boone
Manager, Machine Learning
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Image processing, Neural networks, Extreme ultraviolet, Machine learning, Optical proximity correction, Photoresist processing, Statistical modeling, Performance modeling

Proceedings Article | 14 March 2006 Paper
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Reticles, Optical lithography, Image processing, Error analysis, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

Proceedings Article | 5 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Etching, Quartz, Manufacturing, Chromium, Electroluminescence, Printing, Photomasks, Optical proximity correction, Phase shifts

Proceedings Article | 5 May 2005 Paper
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Semiconductors, Lithography, Reticles, Optical lithography, Data modeling, Optical proximity correction, Semiconducting wafers, Systems modeling, Model-based design, Resolution enhancement technologies

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Statistical analysis, Data modeling, Databases, Error analysis, Photomasks, Optical proximity correction, Product engineering, Statistical modeling, Resolution enhancement technologies

Showing 5 of 10 publications
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