Prof. Robert L. Brainard Profile

Prof. Robert L. Brainard

Professor at University at Albany

SPIE Involvement:

Conference Program Committee | Author

Publications (61)

Proceedings Article | 30 April 2023 Poster

Manipulation of polymer solubility: crosslinking, thermal activation and variable-temperature bakes

Jacob Sitterly, Justin Nhan, Robert Brainard

Proceedings Volume 12498, 124981X (2023) https://doi.org/10.1117/12.2659165

KEYWORDS: Polymers

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Proceedings Article | 30 April 2023 Presentation

Switching the solubility of polymers using intermolecular reactions and diffusion of small molecules

Jacob Sitterly, Justin Nhan, Moira Niluxsshun, Stephen Smith, Robert Brainard

Proceedings Volume 12498, 124980V (2023) https://doi.org/10.1117/12.2659167

KEYWORDS: Switching, Polymers, Molecules

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Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Modeling the acid-catalyzed cleavage of carbon-oxygen bonds

Justin Nhan, Jacob Sitterly, Robert Brainard

Proceedings Volume 11612, 1161210 (2021) https://doi.org/10.1117/12.2583013

KEYWORDS: Photoresist materials, Ions, Polymers, Lithography, Extreme ultraviolet lithography, Deep ultraviolet, Amplifiers

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Proceedings Article | 24 March 2020 Presentation

Enhancing the reactivity of polymerizable antimony carboxylate EUV photoresists (Conference Presentation)

Michael Murphy, James Passarelli, Maximilian Weires, Jodi Grzeskowiak, Robert Brainard

Proceedings Volume 11326, 1132605 (2020) https://doi.org/10.1117/12.2553529

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Proceedings Article | 8 April 2019 Paper

Oligomers of MORE: Molecular Organometallic Resists for EUV

Shaheen Hasan, Michael Murphy, Maximilian Weires, Steven Grzeskowiak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10960, 109601Q (2019) https://doi.org/10.1117/12.2516010

KEYWORDS: Antimony, Extreme ultraviolet lithography, Polymers, Extreme ultraviolet, Polymerization, Photoresist materials, Metals

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Proceedings Article | 27 March 2019 Presentation + Paper

ToF-SIMS analysis of antimony carboxylate EUV photoresists

Michael Murphy, Shaheen Hasan, Steven Novak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10960, 1096010 (2019) https://doi.org/10.1117/12.2516011

KEYWORDS: Antimony, Ions, Extreme ultraviolet lithography, Photoresist materials, Photoresist developing, Oxides, Extreme ultraviolet, Metals, Bismuth

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Proceedings Article | 25 March 2019 Presentation

Measuring extreme-ultraviolet secondary electron blur (Conference Presentation)

Steven Grzeskowiak, Robert Brainard, Gregory Denbeaux

Proceedings Volume 10960, 1096007 (2019) https://doi.org/10.1117/12.2515428

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Lithography, Diffusion, Chemical reactions, Ionization, Printing, Photons, Electron beam lithography

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Proceedings Article | 25 March 2019 Open Access

Metal-containing resists for EUV lithography (Conference Presentation)

Robert Brainard

Proceedings Volume 10960, 1096002 (2019) https://doi.org/10.1117/12.2516012

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Metals, Extreme ultraviolet, Chemical elements, Absorbance, Photons, Optical components

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SPIE Journal Paper | 19 December 2018

First-row transitional-metal oxalate resists for EUV

Miles Wilklow-Marnell, David Moglia, Benjamin Steimle, Brian Cardineau, Hashim Al-Mashat, Peter Nastasi, Kara Heard, Amber Aslam, Rachel Kaminski, Michael Murphy, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber , Yasin Ekinci, Robert Brainard, Daniel Freedman

JM3, Vol. 17, Issue 04, 043507, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043507

KEYWORDS: Extreme ultraviolet, Cobalt, Extreme ultraviolet lithography, Chromium, Metals, Photolysis, Solids, Iron, Electrons, Carbon monoxide

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SPIE Journal Paper | 23 July 2018

Electron trapping: a mechanism for acid production in extreme ultraviolet photoresists

Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, Amrit Narasimhan, Robert Brainard, Greg Denbeaux

JM3, Vol. 17, Issue 03, 033501, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.3.033501

KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Molecules, Absorbance, Chemical reactions, Absorption, Spectroscopy, Electrodes

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Proceedings Article | 28 March 2018 Paper

Investigating the threshold electron energy for reactions in EUV resist materials

Jake Kaminsky, Steven Grzeskowiak, Sean Gibbons, Jonathan Chandonait, Ulrich Welling, Lawrence Melvin, Yudhishthir Kandel, Robert Brainard, Greg Denbeaux

Proceedings Volume 10586, 105861N (2018) https://doi.org/10.1117/12.2297386

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Ionizing radiation, Radiation effects, Electrons, Photons, Polymers, Extreme ultraviolet, Photoresist developing, Standards development

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Proceedings Article | 27 March 2018 Paper

Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)

Jacob Sitterly, Michael Murphy, Steven Grzeskowiak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10586, 105861P (2018) https://doi.org/10.1117/12.2316333

KEYWORDS: Tellurium, Antimony, Bismuth, Extreme ultraviolet lithography, Metals, Carbon monoxide, Extreme ultraviolet, Chromium, Semiconducting wafers, Photoresist materials

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Proceedings Article | 27 March 2018 Paper

Mechanisms of photodecomposition of metal-containing EUV photoresists: isotopic labelling studies

Michael Murphy, Jacob Sitterly, Steven Grzeskowiak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10586, 1058608 (2018) https://doi.org/10.1117/12.2298418

KEYWORDS: Hydrogen, Extreme ultraviolet lithography, Photoresist materials, Antimony, Extreme ultraviolet, Semiconducting wafers, Spectroscopy, Carbon monoxide, Chromium, Molecules

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Proceedings Article | 21 March 2018 Presentation + Paper

Polymer effects on PAG acid yield in EUV resists

Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, Michael Murphy, Jonathan Chandonait, Robert Brainard, Greg Denbeaux

Proceedings Volume 10586, 105860D (2018) https://doi.org/10.1117/12.2297692

KEYWORDS: Electrons, Polymers, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Absorbance, Absorption, Photoresist materials, Polymethylmethacrylate, Liquids

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Proceedings Article | 18 April 2017 Presentation + Paper

Double-deprotected chemically amplified photoresists (DD-CAMP): higher-order lithography

William Earley, Deanna Soucie, Kenji Hosoi, Arata Takahashi, Takashi Aoki, Brian Cardineau, Koichi Miyauchi, Jay Chun, Michael O'Sullivan, Robert Brainard

Proceedings Volume 10146, 101460H (2017) https://doi.org/10.1117/12.2258324

KEYWORDS: Photoresist materials, Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Polymers, Line width roughness, Solids, Polymerization, Sodium, Glasses

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Proceedings Article | 31 March 2017 Presentation + Paper

Advanced development techniques for metal-based EUV resists

Jodi Hotalen, Michael Murphy, William Earley, Michaela Vockenhuber, Yasin Ekinci, Daniel Freedman, Robert Brainard

Proceedings Volume 10143, 1014309 (2017) https://doi.org/10.1117/12.2258126

KEYWORDS: Extreme ultraviolet, Photoresist developing, Cobalt, Platinum, Palladium, Photoresist materials, Imaging systems, Metals, Carbon dioxide, Extreme ultraviolet lithography, Lithography, Light emitting diodes, Photochemistry, Switches, Photons

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Proceedings Article | 31 March 2017 Presentation + Paper

Antimony photoresists for EUV lithography: mechanistic studies

Michael Murphy, Amrit Narasimhan, Steven Grzeskowiak, Jacob Sitterly, Philip Schuler, Jeff Richards, Greg Denbeaux, Robert Brainard

Proceedings Volume 10143, 1014307 (2017) https://doi.org/10.1117/12.2258119

KEYWORDS: Extreme ultraviolet lithography, Antimony, Extreme ultraviolet, Photoresist materials, Photons, Polymerization, Chemical elements, Manufacturing, Metals, Hydrogen, Molecules, Electrons, Spectroscopy, Semiconducting wafers

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Proceedings Article | 27 March 2017 Presentation + Paper

Mechanisms of EUV exposure: electrons and holes

Amrit Narasimhan, Steven Grzeskowiak, Christian Ackerman, Tracy Flynn, Greg Denbeaux, Robert Brainard

Proceedings Volume 10143, 101430W (2017) https://doi.org/10.1117/12.2258321

KEYWORDS: Extreme ultraviolet lithography, Electrons, Chemistry, Polymers, Molecular interactions, Extreme ultraviolet, Photoresist materials, Quantum efficiency, Lithography, Photons, Absorbance, Phase modulation, Molecules

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Proceedings Article | 27 March 2017 Paper

Analytical techniques for mechanistic characterization of EUV photoresists

Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, Christian Ackerman, Jake Kaminsky, Robert Brainard, Greg Denbeaux

Proceedings Volume 10146, 101462C (2017) https://doi.org/10.1117/12.2274128

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Spectroscopy, Extreme ultraviolet, FT-IR spectroscopy, Absorption, Absorption spectroscopy, Lithography, Mass spectrometry, Electrons, Silicon, Hydrogen, Molecules, Photodiodes

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Proceedings Article | 27 March 2017 Presentation + Paper

Reactivity of metal-oxalate EUV resists as a function of the central metal

Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, Lee Napolitano, Daniel Freedman, Robert Brainard, Greg Denbeaux

Proceedings Volume 10146, 1014605 (2017) https://doi.org/10.1117/12.2258151

KEYWORDS: Electrons, Extreme ultraviolet, Metals, Extreme ultraviolet lithography, Photons, Absorption, Photoresist materials, Absorbance, Microelectronics, Carbon monoxide, Carbon dioxide, Iron

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Proceedings Article | 25 March 2016 Paper

Studying electron-PAG interactions using electron-induced fluorescence

Amrit Narasimhan, Steven Grzeskowiak, Jonathan Ostrander, Jonathon Schad, Eliran Rebeyev, Mark Neisser, Leonidas Ocola, Gregory Denbeaux, Robert Brainard

Proceedings Volume 9779, 97790F (2016) https://doi.org/10.1117/12.2219850

KEYWORDS: Electrons, Luminescence, Extreme ultraviolet lithography, Extreme ultraviolet, Molecules, Photons, Lithography, Photoresist materials, Ionization, Molecular interactions, Polymers, Photodiodes, Polymethylmethacrylate, Phase modulation, Quantum efficiency

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Proceedings Article | 21 March 2016 Paper

Cross sections of EUV PAGs: influence of concentration, electron energy, and structure

Steven Grzeskowiak, Amrit Narasimhan, Liam Wisehart, Jonathon Schad, Mark Neisser, Leonidas Ocola, Robert Brainard, Greg Denbeaux

Proceedings Volume 9779, 97790C (2016) https://doi.org/10.1117/12.2219851

KEYWORDS: Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Photochemistry, Ionization, Chemically amplified resists, Mass spectrometry, Electron beams, Absorption, Polymers, Molecular interactions

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Proceedings Article | 18 March 2016 Paper

Energy deposition and charging in EUV lithography: Monte Carlo studies

Liam Wiseheart, Amrit Narasimhan, Steven Grzeskowiak, Mark Neisser, Leonidas Ocola, Greg Denbeaux, Robert Brainard

Proceedings Volume 9776, 97762O (2016) https://doi.org/10.1117/12.2219849

KEYWORDS: Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Solid modeling, Photons, Ionization, Copper, Silicon, Particles

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SPIE Journal Paper | 24 December 2015

Platinum and palladium oxalates: positive-tone extreme ultraviolet resists

Miriam Sortland, Jodi Hotalen, Ryan Del Re, James Passarelli, Michael Murphy, Tero Kulmala, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

JM3, Vol. 14, Issue 04, 043511, (December 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043511

KEYWORDS: Palladium, Platinum, Magnesium, Extreme ultraviolet, Solids, Metals, Lithography, Extreme ultraviolet lithography, Carbon monoxide, Carbonates

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SPIE Journal Paper | 9 November 2015

Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates

Ryan Del Re, James Passarelli, Miriam Sortland, Brian Cardineau, Yasin Ekinci, Elizabeth Buitrago, Mark Neisser, Daniel Freedman, Robert Brainard

JM3, Vol. 14, Issue 04, 043506, (November 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043506

KEYWORDS: Tin, Line edge roughness, Photoresist materials, Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Edge roughness, Crystals, Optical filters

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SPIE Journal Paper | 14 October 2015

Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Jodi Hotalen, Levi Dousharm, Roberto Fallica, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

JM3, Vol. 14, Issue 04, 043503, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043503

KEYWORDS: Antimony, Polymers, Molecules, Chromium, Extreme ultraviolet, Polymerization, Lithography, Bromine, Scanning electron microscopy, Metals

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SPIE Journal Paper | 13 October 2015

Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling

Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Jonathon Schad, Chris Kelly, William Earley, Leonidas Ocola, Mark Neisser, Gregory Denbeaux, Robert Brainard

JM3, Vol. 14, Issue 04, 043502, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043502

KEYWORDS: Extreme ultraviolet, Scattering, Electron beams, Extreme ultraviolet lithography, Photons, Photoresist materials, Ionization, Ellipsometry, Monte Carlo methods, Solid modeling

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Proceedings Article | 20 March 2015 Paper

High-sensitivity molecular organometallic resist for EUV (MORE)

James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Levi Dousharm, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9425, 94250T (2015) https://doi.org/10.1117/12.2086599

KEYWORDS: Polymers, Molecules, Antimony, Extreme ultraviolet, Lithography, Scanning electron microscopy, Metals, Polymerization, Tin, Bismuth

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Proceedings Article | 19 March 2015 Paper

Low-LER tin carboxylate photoresists using EUV

Ryan Del Re, Miriam Sortland, James Pasarelli, Brian Cardineau, Yasin Ekinci, Michaela Vockenhuber, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9422, 942221 (2015) https://doi.org/10.1117/12.2086597

KEYWORDS: Line edge roughness, Tin, Extreme ultraviolet lithography, Photoresist materials, Lithography, Optical lithography, Extreme ultraviolet, Photons, Semiconducting wafers, Neodymium

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Proceedings Article | 19 March 2015 Paper

Positive-tone EUV resists: complexes of platinum and palladium

Miriam Sortland, Ryan Del Re, James Passarelli, Jodi Hotalen, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9422, 942227 (2015) https://doi.org/10.1117/12.2086598

KEYWORDS: Palladium, Extreme ultraviolet, Platinum, Extreme ultraviolet lithography, Lithography, Metals, Carbonates, Absorbance, Photoresist developing, Transition metals

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Proceedings Article | 16 March 2015 Paper

Studying secondary electron behavior in EUV resists using experimentation and modeling

Amrit Narasimhan, Steven Grzeskowiak, Bharath Srivats, Henry Herbol, Liam Wisehart, Chris Kelly, William Earley, Leonidas Ocola, Mark Neisser, Gregory Denbeaux, Robert Brainard

Proceedings Volume 9422, 942208 (2015) https://doi.org/10.1117/12.2086596

KEYWORDS: Photons, Scattering, Extreme ultraviolet lithography, Ionization, Extreme ultraviolet, Photoresist materials, Monte Carlo methods, Ellipsometry, Lithography, Polymers

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Proceedings Article | 4 April 2014 Paper

EUV resists comprised of main group organometallic oligomeric materials

James Passarelli, Brian Cardineau, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9051, 90512A (2014) https://doi.org/10.1117/12.2046537

KEYWORDS: Bismuth, Extreme ultraviolet, Metals, Calibration, Lithography, Chlorine, Post-transition metals, Absorbance, Photons, Photoresist materials

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Proceedings Article | 4 April 2014 Paper

EUV resists based on tin-oxo clusters

Brian Cardineau, Ryan Del Re, Hashim Al-Mashat, Miles Marnell, Michaela Vockenhuber, Yasin Ekinci, Chandra Sarma, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9051, 90511B (2014) https://doi.org/10.1117/12.2046536

KEYWORDS: Tin, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Photoresist materials, Photolysis, Thin films, Semiconducting wafers, Silicon films, Absorbance

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Proceedings Article | 23 March 2012 Paper

Modeling the effects of acid amplifiers on photoresist stochastics

Gregg Gallatin, Patrick Naulleau, Robert Brainard

Proceedings Volume 8322, 83221C (2012) https://doi.org/10.1117/12.917006

KEYWORDS: Line edge roughness, Stochastic processes, Molecules, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Data modeling, Photoresist materials, Lithography, Statistical modeling

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Proceedings Article | 23 March 2012 Paper

A new inorganic EUV resist with high-etch resistance

Markos Trikeriotis, Marie Krysak, Yeon Sook Chung, Christine Ouyang, Brian Cardineau, Robert Brainard, Christopher Ober, Emmanuel Giannelis, Kyoungyong Cho

Proceedings Volume 8322, 83220U (2012) https://doi.org/10.1117/12.916384

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Etching, Nanoparticles, Resistance, Extreme ultraviolet, Absorbance, Electron beam lithography, Line edge roughness, Hafnium

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Proceedings Article | 23 March 2012 Paper

Tightly bound ligands for hafnium nanoparticle EUV resists

Brian Cardineau, Marie Krysak, Markos Trikeriotis, Emmanuel Giannelis, Christopher Ober, Kyoungyong Cho, Robert Brainard

Proceedings Volume 8322, 83220V (2012) https://doi.org/10.1117/12.917014

KEYWORDS: Nanoparticles, Hafnium, Solids, Sodium, Lithography, Extreme ultraviolet, Oxides, Crystals, Magnetism, Bioalcohols

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Proceedings Article | 20 March 2012 Paper

Synthesis of stable acid amplifiers that produce strong highly-fluorinated polymer-bound acid

Kenji Hosoi, Brian Cardineau, William Earley, Seth Kruger, Koichi Miyauchi, Robert Brainard

Proceedings Volume 8325, 83251S (2012) https://doi.org/10.1117/12.917018

KEYWORDS: Polymers, Amplifiers, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Diffusion, Glasses, Molecules, Neck

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Proceedings Article | 20 March 2012 Paper

Stable, fluorinated acid amplifiers for use in EUV lithography

Seth Kruger, Kenji Hosoi, Brian Cardineau, Koichi Miyauchi, Robert Brainard

Proceedings Volume 8325, 832514 (2012) https://doi.org/10.1117/12.917015

KEYWORDS: Amplifiers, Fluorine, Line edge roughness, Extreme ultraviolet lithography, Lithography, Polymers, Photoresist materials, Polymerization, Temperature metrology, Extreme ultraviolet

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Proceedings Article | 16 April 2011 Paper

Coefficient of thermal expansion (CTE) in EUV lithography: LER and adhesion improvement

Craig Higgins, Charles Settens, Patricia Wolfe, Karen Petrillo, Robert Auger, Richard Matyi, Robert Brainard

Proceedings Volume 7972, 797211 (2011) https://doi.org/10.1117/12.879509

KEYWORDS: Line edge roughness, Silicon, Polymers, Lithography, Extreme ultraviolet, Head-mounted displays, Silicon films, Thin films, Extreme ultraviolet lithography, Interfaces

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Proceedings Article | 1 April 2009 Paper

Lithographic evaluation and chemical modeling of acid amplifiers used in EUV photoresists

Robert Brainard, Craig Higgins, Seth Kruger, Srividya Revuru, Brian Cardineau, Sarah Gibbons, Dan Freedman, Harun Solak, Wang Yueh, Todd Younkin

Proceedings Volume 7273, 72733Q (2009) https://doi.org/10.1117/12.814308

KEYWORDS: Amplifiers, Line edge roughness, Lithography, Extreme ultraviolet lithography, Molecules, Oxygen, Thermal modeling, Thermodynamics, Photoresist materials, Polymers

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Proceedings Article | 18 March 2009 Paper

RLS tradeoff vs. quantum yield of high PAG EUV resists

Craig Higgins, Alin Antohe, Greg Denbeaux, Seth Kruger, Jacque Georger, Robert Brainard

Proceedings Volume 7271, 727147 (2009) https://doi.org/10.1117/12.814307

KEYWORDS: Quantum efficiency, Extreme ultraviolet, Line edge roughness, Extreme ultraviolet lithography, Absorbance, Semiconducting wafers, Absorption, Diffusion, Photons, Photoresist materials

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SPIE Press Book | 19 February 2009

Advanced Processes for 193-nm Immersion Lithography

Yayi Wei, Robert Brainard

KEYWORDS: Semiconducting wafers, Photoresist processing, Lithography, Etching, Line edge roughness, Water, Immersion lithography, Coating, Photomasks, Double patterning technology

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Advanced Processes for 193-nm Immersion Lithography

Proceedings Article | 15 April 2008 Paper

Photons, electrons, and acid yields in EUV photoresists: a progress report

Robert Brainard, Elsayed Hassanein, Juntao Li, Piyush Pathak, Brad Thiel, Franco Cerrina, Richard Moore, Miguel Rodriguez, Boris Yakshinskiy, Elena Loginova, Theodore Madey, Richard Matyi, Matt Malloy, Andrew Rudack, Patrick Naulleau, Andrea Wüest, Kim Dean

Proceedings Volume 6923, 692325 (2008) https://doi.org/10.1117/12.773869

KEYWORDS: Electrons, Photons, Quantum efficiency, Extreme ultraviolet, Polymers, Monte Carlo methods, Extreme ultraviolet lithography, Oscillators, Line width roughness, Electronics

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Proceedings Article | 15 April 2008 Paper

Options for high index fluids for third generation 193i lithography

Seth Kruger, Srividya Revuru, Shao-Zhong Zhang, Dimitri Vaughn, Eric Block, Paul Zimmerman, Robert Brainard

Proceedings Volume 6923, 69231O (2008) https://doi.org/10.1117/12.772994

KEYWORDS: Absorbance, Refractive index, Water, Sulfur, Oxygen, Refraction, Liquids, Argon, Potassium, Lithography

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Proceedings Article | 28 March 2008 Paper

Film quantum yields of EUV and ultra-high PAG photoresists

Elsayed Hassanein, Craig Higgins, Patrick Naulleau, Richard Matyi, Gregg Gallatin, Gregory Denbeaux, Alin Antohe, Jim Thackeray, Kathleen Spear, Charles Szmanda, Christopher Anderson, Dimitra Niakoula, Matthew Malloy, Anwar Khurshid, Cecilia Montgomery, Emil Piscani, Andrew Rudack, Jeff Byers, Andy Ma, Kim Dean, Robert Brainard

Proceedings Volume 6921, 69211I (2008) https://doi.org/10.1117/12.774099

KEYWORDS: Quantum efficiency, Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, X-rays, Absorbance, Photons, Coating, Reflectometry, Line edge roughness

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Proceedings Article | 21 March 2008 Paper

Proximity printing using extreme ultraviolet radiation

R. Garg, P. Naulleau, R. Brainard, G. Denbeaux

Proceedings Volume 6921, 69213M (2008) https://doi.org/10.1117/12.772869

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Photoresist materials, Printing, Xenon, Optical filters, Ultraviolet radiation, Silicon, Scanning electron microscopy

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Proceedings Article | 21 March 2008 Paper

Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation

Chimaobi Mbanaso, Gregory Denbeaux, Kim Dean, Robert Brainard, Seth Kruger, Elsayed Hassanein

Proceedings Volume 6921, 69213L (2008) https://doi.org/10.1117/12.772695

KEYWORDS: Extreme ultraviolet lithography, Absorption, Extreme ultraviolet, Photoresist materials, Lithography, Semiconducting wafers, Light, Absorbance, Image quality, Reflectivity

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Proceedings Article | 21 March 2008 Paper

Resolution, LER, and sensitivity limitations of photoresists

Gregg Gallatin, Patrick Naulleau, Dimitra Niakoula, Robert Brainard, Elsayed Hassanein, Richard Matyi, Jim Thackeray, Kathleen Spear, Kim Dean

Proceedings Volume 6921, 69211E (2008) https://doi.org/10.1117/12.772763

KEYWORDS: Line edge roughness, Data modeling, Photoresist materials, Extreme ultraviolet, Lithography, Image resolution, Scanning electron microscopy, Yield improvement, Photoresist developing, Photoresist processing

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Proceedings Article | 20 March 2008 Paper

Evaluation of EUV resist materials for use at the 32 nm half-pitch node

Thomas Wallow, Craig Higgins, Robert Brainard, Karen Petrillo, Warren Montgomery, Chiew-Seng Koay, Greg Denbeaux, Obert Wood, Yayi Wei

Proceedings Volume 6921, 69211F (2008) https://doi.org/10.1117/12.772943

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Line edge roughness, Lithography, Interferometers, Photoresist materials, High volume manufacturing, Printing, Image resolution

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Proceedings Article | 3 May 2007 Paper

Quantitative measurement of EUV resist outgassing

Greg Denbeaux, Rashi Garg, Justin Waterman, Chimaobi Mbanaso, Jeroen Netten, Robert Brainard, Yu-Jen Fan, Leonid Yankulin, Alin Antohe, Kevin DeMarco, Molly Jaffe, Matthew Waldron, Kim Dean

Proceedings Volume 6533, 653318 (2007) https://doi.org/10.1117/12.737192

KEYWORDS: Spectroscopy, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Optical filters, Xenon, Molecular spectroscopy, Calibration, Photoresist materials, Mirrors

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Proceedings Article | 22 March 2007 Paper

Fundamental limits to EUV photoresist

Gregg Gallatin, Patrick Naulleau, Robert Brainard

Proceedings Volume 6519, 651911 (2007) https://doi.org/10.1117/12.712346

KEYWORDS: Line edge roughness, Quantum efficiency, Electrons, Extreme ultraviolet, Diffusion, Extreme ultraviolet lithography, Photoresist materials, Yield improvement, Mathematical modeling, Image quality

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Proceedings Article | 22 March 2007 Paper

Models for predicting the index of refraction of compounds at 193 and 589 nm

Robert Brainard, Seth Kruger, Eric Block

Proceedings Volume 6519, 651920 (2007) https://doi.org/10.1117/12.712431

KEYWORDS: Refraction, Molecules, Liquids, Chemical species, Water, Sodium, Excel, Lithography, Refractive index, Chemical analysis

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Proceedings Article | 4 May 2005 Paper

Performance of EUV photoresists on the ALS micro exposure tool

Thomas Koehler, Robert Brainard, Patrick Naulleau, David Van Steenwinckel, Jeroen Lammers, Kenneth Goldberg, Joseph Mackevich, Peter Trefonas

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600511

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Chemically amplified resists, Lithography, Semiconducting wafers, Image resolution, Scanning electron microscopy, Diffractive optical elements

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Proceedings Article | 20 May 2004 Paper

Shot noise, LER, and quantum efficiency of EUV photoresists

Robert Brainard, Peter Trefonas, Jeroen Lammers, Charlotte Cutler, Joseph Mackevich, Alexander Trefonas, Stewart Robertson

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536411

KEYWORDS: Line edge roughness, Extreme ultraviolet, Molecules, Photons, Deep ultraviolet, Diffusion, Quantum efficiency, Extreme ultraviolet lithography, Optical spheres, Photoresist materials

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The shot noise, line edge roughness (LER) and quantum efficiency of EUV interaction with seven resists related to EUV-2D (SP98248B) are studied. These resists were identical to EUV-2D except were prepared with seven levels of added base while keeping all other resist variables constant. These seven resists were patterned with EUV lithography, and LER was measured on 100-200 nm dense lines. Similarly, the resists were also imaged using DUV lithography and LER was determined for 300-500 nm dense lines. LER results for both wavelengths were plotted against E_size. Both curves show very similar LER behavior-the resists requiring low doses have poor LER, whereas the resists requiring high doses have good LER. One possible explanation for the observed LER response is that the added base improves LER by reacting with the photogenerated acid to control the lateral spread of acid, leading to better chemical contrast at the line edge. An alternative explanation to the observed relationship between LER and E_size is that shot-noise generated LER decreases as the number of photons absorbed at the line edge increases. We present an analytical model for the influence of shot noise based on Poisson statistics that preidicts that the LER is proportional to (E_size)^-1/2. Indeed, both sets of data give straight lines when plotted this way (DUV r² = 0.94; EUV r² = 0.97). We decided to further evaluate this interpretation by constructing a simulation model for shot noise resulting from exposure and acid diffusion at the mask edge. In order to acquire the data for this model, we used the base titration method developed by Szmanda et al. to determine C-parameters and hence the quantum efficiency for producing photogenerated acid. This information, together with film absorptivity, allows the calculation of number and location of acid molecules generated at the mask edgte by assuming a stochastic distribution of individual photons corresponding to the aerial image function. The edge "roughness" of the acid molecule distribution in the film at the mask edge is then simulated as a function of acid diffusion length and compared to the experimental data. In addition, comparisoins between of the number of acid molecules generated and photons consumed leads to values of quantum efficiencies for these EUV resists.

Proceedings Article | 20 May 2004 Paper

Techniques for directly measuring the absorbance of photoresists at EUV wavelengths

Manish Chandhok, Heidi Cao, Wang Yueh, Eric Gullikson, Robert Brainard, Stewart Robertson

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535959

KEYWORDS: Absorbance, Reflectivity, Photoresist materials, Semiconducting wafers, Silicon, Extreme ultraviolet, Grazing incidence, Refraction, Extreme ultraviolet lithography, X-rays

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Proceedings Article | 14 May 2004 Paper

Resist formulation effects on contrast and top-loss as measured by 3D-SEM metrology

Andrew Eckert, Carl Seiler, Robert Brainard

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535723

KEYWORDS: Critical dimension metrology, Metrology, Data modeling, 3D metrology, Semiconducting wafers, 3D modeling, Systems modeling, Lithography, Photoresist processing, Data storage

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Proceedings Article | 16 June 2003 Paper

Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling

Stewart Robertson, Patrick Naulleau, Donna O'Connell, Kevin McDonald, Todd Delano, Kenneth Goldberg, Steven Hansen, Kirk Brown, Robert Brainard

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.499357

KEYWORDS: Photomasks, Photoresist materials, Extreme ultraviolet lithography, Lithography, Calibration, Data modeling, Diffusion, Modeling, Extreme ultraviolet, Wafer-level optics

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Proceedings Article | 16 June 2003 Paper

Effect of polymer molecular weight on AFM polymer aggregate size and LER of EUV resists

Charlotte Cutler, Joseph Mackevich, Jieming Li, Donna O'Connell, Gregory Cardinale, Robert Brainard

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482370

KEYWORDS: Line edge roughness, Polymers, Surface roughness, Extreme ultraviolet, Atomic force microscopy, Deep ultraviolet, Molecular aggregates, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 20 August 2001 Paper

Multiple-anion nonvolatile acetal (MANA) resists

Jeffrey Guevremont, Robert Brainard, Scott Reeves, Xin Zhou, Thinh Nguyen, Joseph Mackevich, Erik Anderson, Gary Taylor

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436655

KEYWORDS: Polymers, Chemistry, Lithography, Humidity, Deep ultraviolet, Model-based design, Semiconducting wafers, Electron beam lithography, Electrons, Polymer thin films

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Proceedings Article | 21 July 2000 Paper

Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure

Leonidas Ocola, Myrtle Blakey, Paul Orphanos, Wai-Yi Li, Anthony Novembre, Robert Brainard, Joseph Mackevich, Gary Taylor

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390055

KEYWORDS: Charged-particle lithography, Deep ultraviolet, Monte Carlo methods, Absorption, Electrons, Polymers, Chemically amplified resists, Lithography, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 25 June 1999 Paper

Ultrathin photoresists for EUV lithography

Veena Rao, Jonathan Cobb, Craig Henderson, Uzodinma Okoroanyanwu, Dan Bozman, Pawitter Mangat, Robert Brainard, Joseph Mackevich

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351135

KEYWORDS: Line edge roughness, Extreme ultraviolet, Photoresist processing, Lithography, Etching, Extreme ultraviolet lithography, Polymers, Photoresist materials, Optical lithography, Silicon

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