Mr. Robert Brandom Profile

Robert Brandom

Technical Sales Support Manager at Nanometrics Inc

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Author

Publications (7)

Proceedings Article | 2 June 2003 Paper

Electron beam metrology of 193-nm resists at ultralow voltage

Neal Sullivan, Ron Dixson, Benjamin Bunday, Martin Mastovich, Paul Knutrud, Pascal Fabre, Robert Brandom

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487598

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Atomic force microscopy, Metrology, Electron beams, Data modeling, Contamination, Semiconducting wafers, Systems modeling, Process control

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Proceedings Article | 2 June 2003 Paper

Web-based metrology performance diagnostics

Ganesh Sundaram, Martin Mastovich, Roye Avidor, Jason Remillard, Robert Brandom

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487603

KEYWORDS: Metrology, Databases, Data communications, Diagnostics, Process control, Computer security, Image quality, Scanning electron microscopy, Pattern recognition, Internet

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Proceedings Article | 2 June 2003 Paper

CD-SEM image acquisition effects on 193-nm resist line slimming

Neal Sullivan, Martin Mastovich, Scott Bowdoin, Robert Brandom

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487604

KEYWORDS: Line edge roughness, Electron beams, Metrology, Critical dimension metrology, Diffractive optical elements, Image acquisition, Transistors, Process control, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 2 June 2003 Paper

193-nm resist: ultralow voltage CD-SEM performance for sub-130-nm contact hole process

John Ferri, Marco Vieira, Mario Reybrouck, Martin Mastovich, Scott Bowdoin, Robert Brandom, Paul Knutrud

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.487597

KEYWORDS: Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Photoresist processing, Metrology, Lithography, Electron beams, Chemical analysis, 193nm lithography, Temperature metrology

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Proceedings Article | 22 August 2001 Paper

Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Michael Fritze, Brian Tyrrell, David Astolfi, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, David Chan, Peter Rhyins, Martin Mastovich, Neal Sullivan, Robert Brandom, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436759

KEYWORDS: Lithography, Semiconducting wafers, Optical lithography, Photomasks, Critical dimension metrology, Reticles, Cadmium, Resolution enhancement technologies, Metrology, Phase shifts

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Proceedings Article | 5 July 2000 Paper

Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

Michael Fritze, James Burns, Peter Wyatt, David Astolfi, T. Forte, Donna Yost, Paul Davis, Andrew Curtis, Douglas Preble, Susan Cann, Sandy Denault, Hua-Yu Liu, Joe Shaw, Neal Sullivan, Robert Brandom, Martin Mastovich

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389028

KEYWORDS: Photomasks, Transistors, Etching, Lithography, Plasma etching, Scanning electron microscopy, Deep ultraviolet, Mask making, Resolution enhancement technologies, Plasma

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Proceedings Article | 5 July 2000 Paper

Application of attenuated phase-shift masks to sub-0.18-um logic patterns

Michael Fritze, Peter Wyatt, David Astolfi, Paul Davis, Andrew Curtis, Douglas Preble, Susan Cann, Sandy Denault, David Chan, Joe Shaw, Neal Sullivan, Robert Brandom, Martin Mastovich

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388955

KEYWORDS: Photomasks, Logic, Lithographic illumination, Image processing, Lithography, Optical proximity correction, Photoresist processing, Optical lithography, Scanning electron microscopy, Semiconductors

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Showing 5 of 7 publications

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