Dr. Robert L. Bristol
Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (36)

SPIE Journal Paper | September 19, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Lithography, Stochastic processes, Microelectromechanical systems, Microopto electromechanical systems

SPIE Journal Paper | June 12, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Lithography, Statistical analysis, Stochastic processes, Photons, Critical dimension metrology, Cadmium, Extreme ultraviolet lithography, Extreme ultraviolet, Quenching (fluorescence), Scanners

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beams, Statistical analysis, Photons, Photoresist materials, Extreme ultraviolet, Cadmium sulfide, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Quenching (fluorescence)

SPIE Journal Paper | February 5, 2015
JM3 Vol. 14 Issue 01
KEYWORDS: Polymethylmethacrylate, Thermal effects, Critical dimension metrology, Error analysis, Lithography, Overlay metrology, Picosecond phenomena, Polymers, Directed self assembly

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Polymethylmethacrylate, Cadmium, Polymers, Error analysis, Computer simulations, Thermal effects, Directed self assembly, Picosecond phenomena, Critical dimension metrology

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Cadmium, Polymers, Directed self assembly, Picosecond phenomena, Analytical research, Critical dimension metrology, Molecular self-assembly

Showing 5 of 36 publications
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