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Robert E. Burkhardt
Product Manager at Applied Materials Inc
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Publications (2)
Proceedings Article | 24 March 2006 Paper
Contact-area metrology of magnetic tunneling junction structures
Tom Zhong, Daniel Liu, Amit Moran, Michael Levkovitch, Michael Har-Zvi, Bob Burkhardt
Proceedings Volume 6152, 61522L (2006) https://doi.org/10.1117/12.659739
KEYWORDS: Critical dimension metrology, Resistance, Magnetism, Process control, Metrology, Semiconducting wafers, Algorithm development, Mobile devices, Cell phones, Consumer electronics
Proceedings Article | 10 May 2005 Paper
Advanced mask metrology enabling characterization of imprint lithography templates
L. Myron, Liraz Gershtein, Gidi Gottlieb, Bob Burkhardt, Andrew Griffiths, David Mellenthin, Kevin Rentzsch, Susan MacDonald, Greg Hughes
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.603718
KEYWORDS: Semiconducting wafers, Lithography, Chromium, Photomasks, Quartz, Critical dimension metrology, Etching, Metrology, Photoresist processing, Cadmium
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