Robert L. Dean
Senior Staff Engineer at Applied Materials Inc
SPIE Involvement:
Author
Publications (21)

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Etching, Coating, Scanning electron microscopy, Photomasks, Optical proximity correction, Raster graphics, Critical dimension metrology, Line edge roughness, Photomicroscopy

PROCEEDINGS ARTICLE | August 28, 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Etching, Coating, Scanning electron microscopy, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Photomicroscopy, Photoresist processing

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beams, Cadmium, Backscatter, Computing systems, Image resolution, Embedded systems, Optical proximity correction, Raster graphics, Photoresist processing, Optical calibration

PROCEEDINGS ARTICLE | August 1, 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Optical lithography, Etching, Control systems, Photomasks, Optical proximity correction, Raster graphics, Edge roughness

PROCEEDINGS ARTICLE | July 1, 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Etching, Dry etching, Image processing, Coating, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | March 11, 2002
Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Optical lithography, Photomasks, Optical proximity correction, Raster graphics, Photoresist processing, Model-based design, Edge roughness

Showing 5 of 21 publications
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