Robert L. Dean
Senior Staff Engineer at Applied Materials Inc
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 20 August 2004 Paper
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Etching, Coating, Scanning electron microscopy, Photomasks, Optical proximity correction, Raster graphics, Critical dimension metrology, Line edge roughness, Photomicroscopy

Proceedings Article | 28 August 2003 Paper
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Lithography, Etching, Coating, Scanning electron microscopy, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Photomicroscopy, Photoresist processing

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beams, Cadmium, Backscatter, Computing systems, Image resolution, Embedded systems, Optical proximity correction, Raster graphics, Photoresist processing, Optical calibration

Proceedings Article | 1 August 2002 Paper
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Optical lithography, Etching, Control systems, Photomasks, Optical proximity correction, Raster graphics, Edge roughness

Proceedings Article | 1 July 2002 Paper
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Etching, Dry etching, Image processing, Coating, Photomasks, Raster graphics, Critical dimension metrology, Line edge roughness, Photoresist processing

Showing 5 of 21 publications
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