Robert Eklund
at Mycronic
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Electron beam lithography, Data modeling, Deep ultraviolet, Printing, Spatial light modulators, Photomasks, Convolution, Raster graphics, Critical dimension metrology, Neodymium

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Quartz, Chromium, Spatial light modulators, Photomasks, Optical alignment, Critical dimension metrology, Neodymium

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Deep ultraviolet, Polymers, Diffusion, Chemistry, Printing, Photoresist materials, Spatial light modulators, Photomasks, Critical dimension metrology, Chemically amplified resists

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Mirrors, Deep ultraviolet, Manufacturing, Image resolution, Spatial light modulators, Micromirrors, Photomasks, Critical dimension metrology, Analog electronics

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top