Robert Eklund
Application Specialist at Mycronic
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Electron beam lithography, Data modeling, Deep ultraviolet, Printing, Spatial light modulators, Photomasks, Convolution, Raster graphics, Critical dimension metrology, Neodymium

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Quartz, Chromium, Spatial light modulators, Photomasks, Optical alignment, Critical dimension metrology, Neodymium

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Deep ultraviolet, Polymers, Diffusion, Chemistry, Printing, Photoresist materials, Spatial light modulators, Photomasks, Critical dimension metrology, Chemically amplified resists

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Mirrors, Deep ultraviolet, Manufacturing, Image resolution, Spatial light modulators, Micromirrors, Photomasks, Critical dimension metrology, Analog electronics

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