Dr. Robert R. Hershey
Director of Marketing and Business Development at Canon Nanotechnologies Inc
SPIE Involvement:
Publications (13)

Proceedings Article | 12 September 2006 Paper
Rob Hershey, Mike Miller, Chris Jones, Mahadevan Ganapathi Subramanian, Xiaoming Lu, Gary Doyle, David Lentz, Dwayne LaBrake
Proceedings Volume 6337, 63370M (2006) https://doi.org/10.1117/12.681481
KEYWORDS: Semiconducting wafers, Light emitting diodes, Photonic crystals, Manufacturing, Etching, Photomasks, Electron beam lithography, Particles, Quartz, Lithography

Proceedings Article | 22 August 2001 Paper
Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436771
KEYWORDS: Single crystal X-ray diffraction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Process control, Spectroscopy, Spectroscopes, Metrology, Precision measurement, Control systems

Proceedings Article | 2 June 2000 Paper
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386465
KEYWORDS: Scatterometry, Reflectivity, Scanning electron microscopy, Critical dimension metrology, Metrology, Silicon, Atomic force microscopy, Manufacturing, Process control, Semiconducting wafers

Proceedings Article | 26 July 1999 Paper
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354335
KEYWORDS: Critical dimension metrology, Error analysis, Optical lithography, Semiconducting wafers, Reticles, Metrology, Deep ultraviolet, Lithography, Reflectivity, Resistance

Proceedings Article | 8 June 1998 Paper
John Sturtevant, Michele Weilemann, Kent Green, John Dwyer, Eric Robertson, Robert Hershey
Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308788
KEYWORDS: Critical dimension metrology, Overlay metrology, Lithography, Control systems, Deep ultraviolet, Manufacturing, Etching, Optical lithography, Semiconducting wafers, Scanners

Showing 5 of 13 publications
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