Dr. Robert R. Hershey
Director of Marketing and Business Development at Canon Nanotechnologies Inc
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | September 12, 2006
Proc. SPIE. 6337, Sixth International Conference on Solid State Lighting
KEYWORDS: Lithography, Electron beam lithography, Light emitting diodes, Etching, Quartz, Particles, Manufacturing, Photonic crystals, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | August 22, 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Metrology, Spectroscopy, Control systems, Scanning electron microscopy, Precision measurement, Process control, Critical dimension metrology, Semiconducting wafers, Spectroscopes, Single crystal X-ray diffraction

PROCEEDINGS ARTICLE | June 2, 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Metrology, Silicon, Manufacturing, Reflectivity, Atomic force microscopy, Scanning electron microscopy, Scatterometry, Process control, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | July 26, 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Lithography, Reticles, Metrology, Optical lithography, Deep ultraviolet, Error analysis, Resistance, Reflectivity, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | June 8, 1998
Proc. SPIE. 3332, Metrology, Inspection, and Process Control for Microlithography XII
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Etching, Scanners, Manufacturing, Control systems, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | July 7, 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Lithography, Logic, Optical lithography, Deep ultraviolet, Manufacturing, Resistance, Critical dimension metrology

Showing 5 of 13 publications
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