Mr. Robert N. Kestner Profile

Robert N. Kestner

Consultant at Akumen Engineering LLC

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Author

Publications (9)

Proceedings Article | 9 August 2016 Paper

Development of high reflectivity coatings for large format Fabry-Perot etalons

M. Sigwarth, J. Baumgartner, A. Bell, G. Cagnoli, A. Fischer, C. Halbgewachs, F. Heidecke, Th. Kentischer, B. Kestner, P. Kuschnir, O. von der Lühe, L. Pinard, Ch. Michel, W. Reichman, B. Sassolas, Th. Scheiffelen, W. Schmidt

Proceedings Volume 9908, 99084F (2016) https://doi.org/10.1117/12.2232271

KEYWORDS: Fabry–Perot interferometers, Optical coatings, Reflectivity, Silica, Antireflective coatings, Prototyping, Annealing, Ion beam finishing, Thin film coatings, Polishing

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The Visible Tunable Filter (VTF) is a diffraction-limited narrowband tunable instrument for imaging spectropolarimetry in the wavelength range between 520 and 860 nm. It is based on large-format Fabry Perot. The instrument will be one of the first-light instruments of the 4m aperture Daniel K. Inoue Solar Telescope (DKIST). To provide a field of view of 1 arcmin and a spectral resolution λ/Δλ of about 100.000, the required free aperture of the Fabry Perot is 250mm. The high reflectivity coatings for the Etalon plates need to meet the specifications for the reflectivity over the entire wavelength range and preserve the plate figure specifications of better λ/300, and a micro roughness of < 0.4 nm rms. Coated surfaces with similar specifications have successfully been made for reflecting mirrors on thick substrates but not for larger format Fabry-Perot systems. Ion Beam Sputtering (IBS) based coatings provide stable, homogeneous, and smooth coatings. But IBS coatings also introduce stresses to the substrate that influence the plate figure in our case at the nm level. In a joint effort with an industry partner and a French CNRS research laboratory, we developed and tested processes on small and full size substrates, to provide coated Etalon plates to the required specifications. Zygo Extreme Precision Optics, Richmond, CA, USA, is polishing and figuring the substrates, doing the metrology and FE analysis. LMA (Laboratoire Matériaux Avancés, Lyon, France) is designing and making the IBS coatings and investigating the detailed behavior of the coatings and related processes. Both partners provide experience from manufacturing coated plane optics for gravitational wave detection experiments and EUV optics. The Kiepenheuer-Institut für Sonnenphysik, Freiburg, Germany is designing and building the VTF instrument and is leading the coating development. We present the characteristics of the coatings and the substrate processing concept, as well as results from tests on sample size and from full size substrate processing. We demonstrate that the tight specifications for a single Etalon can be reached.

SPIE Journal Paper | 11 July 2016

Validation of the corrective optics on the Hubble Space Telescope 1st Servicing Mission

Kevin Thompson, Robert Kestner, J. Michael Rodgers, Daniel Bajuk

JATIS, Vol. 2, Issue 03, 034001, (July 2016) https://doi.org/10.1117/12.10.1117/1.JATIS.2.3.034001

KEYWORDS: Mirrors, Cameras, Monochromatic aberrations, Computer generated holography, Hubble Space Telescope, Space telescopes, Telescopes, Optical design, Interferometers, Astronomical imaging

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Proceedings Article | 18 March 2016 Paper

Current development status of HSFET (High NA Small Field Exposure Tool) in EIDEC

Satoshi Tanaka, Shunko Magoshi, Hidemi Kawai, Soichi Inoue, Wylie Rosenthal, Luc Girard, Lou Marchetti, Bob Kestner, John Kincade

Proceedings Volume 9776, 97761N (2016) https://doi.org/10.1117/12.2219368

KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Process control, Photomasks, Lithography, Optical design, Projection systems, Polarization, Mirrors, Reticles, Semiconducting wafers

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Proceedings Article | 11 October 2015 Paper

Fabrication of EUVL micro-field exposure tools with 0.5 NA

Luc Girard, Lou Marchetti, Mark Bremer, Jim Kennon, Bob Kestner, Sam Hardy

Proceedings Volume 9633, 96330V (2015) https://doi.org/10.1117/12.2203138

KEYWORDS: Wavefronts, Mirrors, Optical fabrication, Optical testing, Optical alignment, Extreme ultraviolet, Reticles, Metrology, Optical coatings, Extreme ultraviolet lithography

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Proceedings Article | 17 April 2014 Paper

Projection optics for EUVL micro-field exposure tools with 0.5 NA

Holger Glatzel, Dominic Ashworth, Dan Bajuk, Matt Bjork, Mark Bremer, Mark Cordier, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Samuel Hardy, Russ Hudyma, James Kennon, Robert Kestner, Lou Marchetti, Keyvan Nouri, Patrick Naulleau, Daniel Pierce, Regina Soufli, Eberhard Spiller, Yogesh Verma

Proceedings Volume 9048, 90481K (2014) https://doi.org/10.1117/12.2048643

KEYWORDS: Mirrors, Metrology, Wavefronts, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography, Optical coatings, Lithography, Optical fabrication

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Proceedings Article | 17 April 2014 Paper

Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

Kevin Cummings, Dominic Ashworth, Mark Bremer, Rodney Chin, Yu-Jen Fan, Luc Girard, Holger Glatzel, Michael Goldstein, Eric Gullikson, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Johannes Bauer, Markus Mengel, Joachim Welker, Michael Grupp, Erik Sohmen, Stefan Wurm

Proceedings Volume 9048, 90481M (2014) https://doi.org/10.1117/12.2046380

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Projection systems, Lithography, Reticles, Cameras, Artificial intelligence, Optical lithography, Wavefronts, Sensors

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Proceedings Article | 1 April 2013 Paper

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Holger Glatzel, Dominic Ashworth, Mark Bremer, Rodney Chin, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Russ Hudyma, Jim Kennon, Bob Kestner, Lou Marchetti, Patrick Naulleau, Regina Soufli, Eberhard Spiller

Proceedings Volume 8679, 867917 (2013) https://doi.org/10.1117/12.2012698

KEYWORDS: Mirrors, Multilayers, Wavefronts, Extreme ultraviolet lithography, Aspheric lenses, Metrology, Extreme ultraviolet, Projection systems, Lithography, Optical testing

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Proceedings Article | 18 October 2004 Paper

System wavefront correction using a complex aspheric mirror

Robert Kestner, Chris Witebsky, Richard Lyon, Robert Woodruff

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.567162

KEYWORDS: Wavefronts, Mirrors, Aspheric optics, Spatial frequencies, Planets, Stars, Space telescopes, Off axis mirrors, Telescopes, Aspheric lenses

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Proceedings Article | 8 September 1995 Paper

Verification and certification of CGH aspheric nulls

Steven Arnold, Robert Kestner

Proceedings Volume 2536, (1995) https://doi.org/10.1117/12.218414

KEYWORDS: Computer generated holography, Computer programming, Aspheric lenses, Diffraction, Etching, Interferometers, Error analysis, Wavefronts, Diffraction gratings, Spatial resolution

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Showing 5 of 9 publications

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