Prof. Robert M. Kiefer
Lithography Development Engineer at Toppan Photomasks Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Deep ultraviolet, Metals, Printing, Photomasks, Artificial intelligence, Optical alignment, Bragg cells, Semiconducting wafers, Evolutionary algorithms

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Diffractive optical elements, Deep ultraviolet, Printing, Objectives, Photomasks, Image enhancement, Optical proximity correction, Bragg cells, Semiconducting wafers, Vestigial sideband modulation

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Optical lithography, Diffractive optical elements, Deep ultraviolet, Metals, Control systems, Objectives, Photomasks, Image enhancement, Optical proximity correction, Bragg cells

Proceedings Article | 6 December 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Mirrors, Reticles, Deep ultraviolet, Photomasks, Servomechanisms, Artificial intelligence, Semiconducting wafers, Signal detection, Vestigial sideband modulation

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Electron beam lithography, Lithographic illumination, Deep ultraviolet, Manufacturing, Solids, Photomasks, Semiconducting wafers, Tolerancing, Vestigial sideband modulation

Showing 5 of 9 publications
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