Dr. Robert J. LeSuer
at Univ of Texas/Austin
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Polymers, Water, Interfaces, Photoresist materials, Scintillation, Immersion lithography, Fluorine, Semiconducting wafers, Signal detection, Liquids

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Polymers, Water, Silicon, Photoresist materials, Refraction, Spectroscopic ellipsometry, Scintillation, Immersion lithography, Semiconducting wafers, Liquids

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Electrodes, Water, Microscopy, Interfaces, Mercury, Chemistry, Platinum, Immersion lithography, Scanning probe microscopy, Antimony

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