Robert M. Lugg
R&D OPC at Synopsys Inc
SPIE Involvement:
Author
Publications (18)

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Roads, Lithographic illumination, Detection and tracking algorithms, Image segmentation, Laser induced breakdown spectroscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing

Proceedings Article | 4 March 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Optical lithography, Roads, Lithographic illumination, Photomasks, Semiconductor manufacturing, Immersion lithography, Optical proximity correction, Model-based design, Process modeling

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Etching, Particles, Photomasks, Optical proximity correction, Semiconducting wafers, Statistical modeling, Process modeling

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Optical lithography, Atrial fibrillation, Data modeling, Image segmentation, Scanners, Manufacturing, Printing, Photomasks, Optical proximity correction, Process modeling

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Logic, Nano opto mechanical systems, Atrial fibrillation, Diffractive optical elements, Metals, Image segmentation, Process control, Optical proximity correction, Critical dimension metrology, Process modeling

Showing 5 of 18 publications
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