Robert Muller
at Broadcom Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Reticles, Metrology, Logic, Time metrology, Precision measurement, Distance measurement, Photomasks, Algorithm development, Binary data, Standards development

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Reticles, Metrology, Logic, Time metrology, Photomasks, Cadmium sulfide, Critical dimension metrology, Semiconducting wafers, Tolerancing

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Logic, Etching, Dry etching, Manufacturing, Platinum, Photomasks, Wet etching, Line edge roughness, Edge roughness

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Logic, Contamination, Silicon, Inspection, Photomasks, Image classification, Semiconducting wafers, Classification systems, Defect inspection

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