Bob J. Naber
Principal Consultant at enableDFM & IoT
SPIE Involvement:
Conference Chair | Symposium Chair | Author
Area of Expertise:
DFM , Double Patterning , Cross functional integrator , Plasma , Disruptive solutions , Lithography
Publications (22)

PROCEEDINGS ARTICLE | November 16, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Logic, Optical lithography, Deep ultraviolet, Design for manufacturing, Photomasks, Double patterning technology, Algorithm development, Performance modeling, Model-based design, Rule based systems

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Metals, Error analysis, Resistance, Capacitance, Photomasks, Double patterning technology, Overlay metrology, Device simulation, Resolution enhancement technologies

SPIE Conference Volume | October 2, 2007

SPIE Conference Volume | October 20, 2006

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Logic, Optical lithography, Scanners, Photomasks, Double patterning technology, Optical proximity correction, Neodymium, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Data modeling, Calibration, Scanners, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Process modeling, Resolution enhancement technologies

Showing 5 of 22 publications
Conference Committee Involvement (5)
Photomask Technology
18 September 2007 | Monterey, California, United States
SPIE Photomask Technology
17 September 2007 | Monterey, United States
Photomask Technology
19 September 2006 | Monterey, California, United States
SPIE Photomask Technology
18 September 2006 | Monterey, United States
Critical Review: 64 To 256 Megabit Reticle Generation: Technology Requirements and Approaches
3 January 1994 |
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