Robert J. Naber
Principal Consultant at enable DFM & IoT
SPIE Involvement:
Conference Chair | Symposium Chair | Author
Area of Expertise:
DFM , Double Patterning , Cross functional integrator , Plasma , Disruptive solutions , Lithography
Publications (20)

Proceedings Article | 16 November 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Logic, Optical lithography, Deep ultraviolet, Design for manufacturing, Photomasks, Double patterning technology, Algorithm development, Performance modeling, Model-based design, Rule based systems

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Metals, Error analysis, Resistance, Capacitance, Photomasks, Double patterning technology, Overlay metrology, Device simulation, Resolution enhancement technologies

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Logic, Optical lithography, Scanners, Photomasks, Double patterning technology, Optical proximity correction, Neodymium, Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Data modeling, Calibration, Scanners, Manufacturing, Design for manufacturing, Photomasks, Optical proximity correction, Process modeling, Resolution enhancement technologies

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Calibration, Image processing, Manufacturing, Photomasks, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Systems modeling, Process modeling, Resolution enhancement technologies

Showing 5 of 20 publications
Conference Committee Involvement (3)
SPIE Photomask Technology
17 September 2007 | Monterey, United States
SPIE Photomask Technology
18 September 2006 | Monterey, United States
64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review
1 January 1994 |
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