Robert H. Olshausen
Senior Process Engineer at Intel Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 5 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Quartz, Chromium, Optical testing, Scanning electron microscopy, Photomasks, Neodymium, Tolerancing, Overlay metrology, Phase shifts

Proceedings Article | 5 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Deep ultraviolet, Calibration, Spatial light modulators, Critical dimension metrology, Data conversion, Neodymium, Photoresist processing, Binary data, Overlay metrology

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Quartz, Chromium, Spatial light modulators, Photomasks, Optical alignment, Critical dimension metrology, Neodymium

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