Dr. Robert J. Rafac Profile

Dr. Robert J. Rafac

Scientist at Cymer LLC

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Author

Publications (19)

Proceedings Article | 22 February 2021 Poster + Presentation

Advances toward high power EUV sources for EUVL scanners for HVM in the next decade and beyond

David Brandt, Michael Purvis, Igor Fomenkov, Daniel Brown, Alex Schafgans, Peter Mayer, Rob Rafac

Proceedings Volume 11609, 116091E (2021) https://doi.org/10.1117/12.2584413

KEYWORDS: Extreme ultraviolet lithography, Scanners, Extreme ultraviolet, Tin, Semiconductors, Laser stabilization, Laser applications, High volume manufacturing

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Proceedings Article | 9 September 2019 Presentation

Laser-produced plasma incoherent EUV light sources for high-volume manufacturing semiconductor lithography (Conference Presentation)

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Peter Mayer, Klaus Hummler, Martijn Leenders, Yezheng Tao, Slava Rokitski, Jayson Stewart, Alex Ershov, Robert Rafac, Silvia De Dea, Georgiy Vaschenko, David Brandt, Daniel Brown

Proceedings Volume 11111, 111110K (2019) https://doi.org/10.1117/12.2534691

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Proceedings Article | 3 October 2018 Presentation + Paper

NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W

Igor Fomenkov, Michael Purvis, Alexander Schafgans, Yezheng Tao, Slava Rokitski, Jayson Stewart, Andrew LaForge, Alexander Ershov, Robert Rafac, Silvia De Dea, Chirag Rajyaguru, Georgiy Vaschenko, Mathew Abraham, David Brandt, Daniel Brown

Proceedings Volume 10809, 108091L (2018) https://doi.org/10.1117/12.2502801

KEYWORDS: Extreme ultraviolet, High volume manufacturing

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Proceedings Article | 10 May 2018 Paper

Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Mike Vargas, Spencer Rich, Yezheng Tao, Slava Rokitski, Melchior Mulder, Erik Buurman, Michael Kats, Jayson Stewart, Andrew LaForge, Chirag Rajyaguru, Georgiy Vaschenko, Alex Ershov, Robert Rafac, Mathew Abraham, David Brandt, Daniel Brown

Proceedings Volume 10583, 1058327 (2018) https://doi.org/10.1117/12.2305955

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Plasma, Tin, High volume manufacturing, Semiconducting wafers, Reflectivity, EUV optics, Photoresist materials

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Proceedings Article | 5 May 2017 Presentation

Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)

Alexander Schafgans, Daniel Brown, Igor Fomenkov, Yezheng Tao, Michael Purvis, Slava Rokitski, Georgiy Vaschenko, Robert Rafac, David Brandt

Proceedings Volume 10143, 101431I (2017) https://doi.org/10.1117/12.2258628

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Lithography, Current controlled current source

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Proceedings Article | 16 March 2015 Paper

Performance optimization of MOPA pre-pulse LPP light source

Alexander Schafgans, Daniel Brown, Igor Fomenkov, Rick Sandstrom, Alex Ershov, Georgiy Vaschenko, Rob Rafac, Michael Purvis, Slava Rokitski, Yezheng Tao, Daniel Riggs, Wayne Dunstan, Matthew Graham, Nigel Farrar, David Brandt, Norbert Böwering, Alberto Pirati, Noreen Harned, Christian Wagner, Hans Meiling, Ron Kool

Proceedings Volume 9422, 94220B (2015) https://doi.org/10.1117/12.2087421

KEYWORDS: Extreme ultraviolet, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Plasma, Amplifiers, High power lasers, Tin, Laser energy, High volume manufacturing

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Proceedings Article | 17 April 2014 Paper

Laser produced plasma light source development for HVM

Igor Fomenkov, David Brandt, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Norbert Böwering, Daniel Riggs, Robert Rafac, Silvia De Dea, Michael Purvis, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Robert Kazinczi, Alberto Pirati

Proceedings Volume 9048, 904835 (2014) https://doi.org/10.1117/12.2048195

KEYWORDS: Plasma, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Tin, Light sources, Deep ultraviolet, Laser development, Hydrogen, Laser applications

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Proceedings Article | 18 March 2014 Paper

LPP EUV source readiness for NXE 3300B

David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Norbert Böwering, Daniel Riggs, Robert Rafac, Silvia De Dea, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Alberto Pirati, Robert Kazinczi

Proceedings Volume 9048, 90480C (2014) https://doi.org/10.1117/12.2048184

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Control systems, Tin, Reflectivity, Mirrors, Pulsed laser operation, Laser scanners

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Proceedings Article | 12 April 2013 Paper

High power 120W ArF immersion XLR laser system for high dose applications

R. Rokitski, R. Rafac, J. Melchior, R. Dubi, J. Thornes, T. Cacouris, M. Haviland, D. Brown

Proceedings Volume 8683, 86831H (2013) https://doi.org/10.1117/12.2012681

KEYWORDS: Light sources, Laser systems engineering, Semiconducting wafers, Optical lithography, Lithography, Time metrology, Deep ultraviolet, Amplifiers, Excimer lasers, Reliability

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Proceedings Article | 1 April 2013 Paper

CO2/Sn LPP EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich

Proceedings Volume 8679, 86791G (2013) https://doi.org/10.1117/12.2011212

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Mirrors, Tin, Pulsed laser operation, Plasma systems, Laser scanners

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Proceedings Article | 23 March 2012 Paper

Laser produced plasma EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Michael Lercel, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Alexander Bykanov, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christian Wittak, Michael Woolston, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao

Proceedings Volume 8322, 83221I (2012) https://doi.org/10.1117/12.916521

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Mirrors, Coating, Manufacturing, Tin, Semiconducting wafers, Laser scanners

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Proceedings Article | 23 March 2011 Paper

High-range laser light bandwidth measurement and tuning

Kevin O'Brien, Rui Jiang, Nora Han, Efrain Figueroa, Raj Rao, Robert Rafac

Proceedings Volume 7973, 797326 (2011) https://doi.org/10.1117/12.881167

KEYWORDS: Metrology, Control systems, Light sources, Laser stabilization, Lithography, Light, Laser drilling, Switching, Sensors, Optical testing

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Proceedings Article | 16 March 2009 Paper

Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

Rostislav Rokitski, Vladimir Fleurov, Robert Bergstedt, Hong Ye, Robert Rafac, Robert Jacques, Fedor Trintchouk, Toshihiko Ishihara, Rajasekhar Rao, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 7274, 72743O (2009) https://doi.org/10.1117/12.816049

KEYWORDS: Double patterning technology, Polarization, Laser stabilization, Light sources, Scanners, High volume manufacturing, Immersion lithography, Lithography, Deep ultraviolet, Modulation

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Deep ultraviolet (DUV) lithography improvements have been focused on two paths: further increases in the effective numerical aperture (NA) beyond 1.3, and double patterning (DP). High-index solutions for increasing the effective NA have not gained significant momentum due to several technical factors, and have been eclipsed by an aggressive push to make DP a high-volume manufacturing solution. The challenge is to develop a cost-effective solution using a process that effectively doubles the lithography steps required for critical layers, while achieving a higher degree of overlay performance. As a result, the light source requirements for DP fall into 3 main categories: (a) higher power to enable higher throughput on the scanner, (b) lower operating costs to offset the increased number of process steps, and (c) high stability of optical parameters to support more stringent process requirements. The XLR 600i (6kHz, 90W @15mJ) was introduced last year to enable DP by leveraging the higher performance and lower operating costs of the ring architecture XLR 500i (6kHz, 60W @10mJ) platform currently used for 45nm immersion lithography in production around the world. In February 2009, the XLR 600ix was introduced as a 60/90W switchable product to provide flexibility in the transition to higher power requirements as scanner capabilities are enhanced. The XLR 600ix includes improved optics materials to meet reliability requirements while operating at higher internal fluences. In this paper we will illustrate the performance characteristics during extended testing. Examples of performance include polarization stability, divergence and pointing stability, which enable consistent pupil fill under extreme illumination conditions, as well as overall thermal stability which maintains constant beam performance under large changes in laser operating modes. Furthermore, the unique beam uniformity characteristics that the ring architecture generates result in lower peak energy densities that are comparable to those of a typical 60W excimer laser. In combination with the XLR's long pulse duration, this allows for long life scanner optics while operating at 15mJ.

Proceedings Article | 15 March 2006 Paper

Effects of laser bandwidth on OPE in a modern lithography tool

Kevin Huggins, Toki Tsuyoshi, Meng Ong, Robert Rafac, Christopher Treadway, Devashish Choudhary, Takehito Kudo, Shigeru Hirukawa, Stephen Renwick, Nigel Farrar

Proceedings Volume 6154, 61540Z (2006) https://doi.org/10.1117/12.656816

KEYWORDS: Critical dimension metrology, Scanners, Lithography, Molybdenum, Optical proximity correction, Fiber optic illuminators, Spectroscopy, Light sources, Fluorine, Data modeling

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Proceedings Article | 15 March 2006 Paper

Active spectral control of DUV light sources for OPE minimization

Wayne Dunstan, Robert Jacques, Robert Rafac, Rajasekhar Rao, Fedor Trintchouk

Proceedings Volume 6154, 61542J (2006) https://doi.org/10.1117/12.659283

KEYWORDS: Actuators, Light sources, Fluorine, Deep ultraviolet, Molybdenum, Imaging systems, Optical proximity correction, Metrology, Control systems, Laser stabilization

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Proceedings Article | 12 May 2005 Paper

XLA-200: the third-generation ArF MOPA light source for immersion lithography

Toshihiko Ishihara, Robert Rafac, Wayne Dunstan, Fedor Trintchouk, Christian Wittak, Richard Perkins, Robert Bergstedt, Walter Gillespie

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600075

KEYWORDS: Gas lasers, Pulsed laser operation, Polarization, Molybdenum, Light sources, Spectroscopy, Immersion lithography, Fluorine, Birefringence, Beam controllers

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Proceedings Article | 28 May 2004 Paper

Overcoming limitations of etalon spectrometers used for spectral metrology of DUV excimer light sources

Robert Rafac

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.556622

KEYWORDS: Spectrometers, Fabry–Perot interferometers, Light sources, Metrology, Deep ultraviolet, Lithography, Inspection, Excimers, Excimer lasers, Gas lasers

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Proceedings Article | 26 June 2003 Paper

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Vladimir Fleurov, Daniel Colon, Daniel Brown, Patrick O'Keeffe, Herve Besaucele, Alexander Ershov, Fedor Trintchouk, T. Ishihara, Paolo Zambon, R. Rafac, A. Lukashev

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485358

KEYWORDS: Molybdenum, Light sources, Excimers, Control systems, Lithography, Optical amplifiers, Acoustics, Optical lithography, Oscillators, Energy efficiency

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Proceedings Article | 3 May 2001 Paper

Sub-dekahertz spectroscopy of 199Hg+

James Bergquist, R. Rafac, Brent Young, James Beall, Wayne Itano, David Wineland

Proceedings Volume 4269, (2001) https://doi.org/10.1117/12.424455

KEYWORDS: Ions, Clocks, Chemical species, Magnetism, Spectroscopy, Mercury, Laser beam diagnostics, Laser stabilization, Optical clocks, Polarizability

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Showing 5 of 19 publications

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