Robert Rodriguez
at Cornell Univ
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Refractive index, Nanoparticles, Water, Ultraviolet radiation, Photoresist materials, Immersion lithography, Nanocomposites, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Oxides, Refractive index, Nanoparticles, Water, Particles, Dynamic light scattering, Immersion lithography, Hafnium, Fluid dynamics, Absorption

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Refractive index, Nanoparticles, Polymers, Sulfur, Chemistry, Absorbance, Immersion lithography, Line edge roughness, Chlorine

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Oxides, Refractive index, Transparency, Nanoparticles, Metals, Water, Ultraviolet radiation, Absorbance, Nanocomposites, Polarizability

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