Dr. Robert M. Routh
Engineering Research Sr. Manager at ASML US Inc
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Optical lithography, Metals, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Double patterning technology, Immersion lithography, Optical proximity correction

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Semiconductors, Logic, Scanners, Scanning electron microscopy, Double patterning technology, Chemical reactions, Thin film coatings, Photoresist processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Reticles, Data modeling, Diffusion, Diagnostics, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Photoresist processing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Lithography, Logic, Polymers, Scanning electron microscopy, Photomasks, Double patterning technology, Semiconducting wafers, Overlay metrology, Defect inspection

SPIE Journal Paper | January 1, 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Double patterning technology, Image processing, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Printing, Reticles, Cadmium, Lithography, Line width roughness

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Etching, Metals, Scanners, Photomasks, Extreme ultraviolet, Transistors, Extreme ultraviolet lithography, Optical proximity correction, Photoresist processing, Semiconducting wafers

Showing 5 of 8 publications
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