Dr. Robert J. Socha
Imaging Scientist at ASML Brion
SPIE Involvement:
Fellow status | Conference Program Committee | Author | Instructor
Publications (103)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Polarization, Sensors, Etching, Scanners, Monte Carlo methods, Optical alignment, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Avalanche photodetectors, Optical lithography, Sensors, Scanners, Signal processing, Far infrared, Optical alignment, Semiconducting wafers, Signal detection, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Lithographic illumination, Imaging systems, Image processing, 3D modeling, Zernike polynomials, Photomasks, Extreme ultraviolet lithography, SRAF, Critical dimension metrology, 3D image processing

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Avalanche photodetectors, Optical lithography, Etching, Scanners, Silicon, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Thin films, Diffraction, Polarization, Scanners, Electroluminescence, Photoresist materials, Photomasks, Source mask optimization, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Metrology, Diffractive optical elements, Data modeling, Calibration, Scanners, Micromirrors, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 103 publications
Conference Committee Involvement (5)
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Photomask Technology
19 September 2011 | Monterey, California, United States
Photomask Technology
13 September 2010 | Monterey, California, United States
Photomask Technology
15 September 2009 | Monterey, California, United States
Course Instructor
SC707: Basics of Optical Imaging in Microlithography: A Hands-on Approach
A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).
SC707B: Basics of Optical Imaging in Microlithography: A Hands-On Approach
A basic 'hands on' lecture is presented, in which students are given various optical components, including a source, lenses, gratings, etc., that are used to build a personal optical bench. Basic concepts of imaging, resolution, coherence factor, on-axis illumination, off-axis illumination, binary masks, phase-shift masks, etc., are examined by the students operating in small groups under the direction of the instructor. These concepts are related to real lithographic systems using basic principles and simulation. This course is intended to provide a foundation for the follow-on course, "Imaging and Optics Fundamentals in Microlithography" (SC706).
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