Dr. Robert Watso
Design Engineer at ASML US Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 22 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Reticles, Logic, Optical lithography, Metals, Photomasks, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Tolerancing

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Reticles, Data modeling, Diffusion, Diagnostics, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Photoresist processing

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Particles, Silicon, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Molecular bridges, Imaging systems, Scanners, Particles, Manufacturing, Printing, Bridges, Double patterning technology, Immersion lithography, Semiconducting wafers

Proceedings Article | 20 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Polymers, Scanners, Coating, Digital watermarking, Platinum, Bridges, Photoresist processing, Semiconducting wafers, Standards development, Defect inspection

Showing 5 of 6 publications
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