Robert A. Wildfeuer
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Publications (6)

Proceedings Article | 24 March 2008 Paper
Uwe Kramer, David Jackisch, Robert Wildfeuer, Stefan Fuchs, Franck Jauzion-Graverolle, Gilad Ben-Nahumb, Ovadya Menadeva, Stefano Ventola
Proceedings Volume 6922, 69221C (2008)
KEYWORDS: Electrochemical etching, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Computer aided design, Metrology, Calibration, Finite element methods, Environmental monitoring

Proceedings Article | 28 March 2007 Paper
M. Keck, C. Bodendorf, T. Schmidtling, R. Schlief, R. Wildfeuer, S. Zumpe, M. Niehoff
Proceedings Volume 6520, 652044 (2007)
KEYWORDS: Optical proximity correction, Process modeling, Data modeling, Photoresist processing, Etching, Error analysis, Scanning electron microscopy, 3D modeling, Wafer-level optics, Statistical modeling

Proceedings Article | 10 March 2006 Paper
ChinTeong Lim, Vlad Temchenko, Woong-Jae Chung, Dave Wallis, Robert Wildfeuer, Uta Mierau, Sebastian Schmidt, Martin Niehoff
Proceedings Volume 6155, 615503 (2006)
KEYWORDS: Data modeling, Calibration, Photoresist processing, Optical proximity correction, Process modeling, Optical calibration, Diffusion, Coherence (optics), Statistical modeling, Model-based design

Proceedings Article | 16 August 2002 Paper
Proceedings Volume 4764, (2002)
KEYWORDS: Inspection, Reticles, Thin films, Cadmium, Lithography, Optical lithography, Optical simulations, 3D modeling, Performance modeling, Diffusion

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002)
KEYWORDS: 3D modeling, Photoresist processing, Absorption, 3D image processing, Lithography, Process modeling, Optical lithography, Algorithm development, Diffusion, Photoresist materials

Showing 5 of 6 publications
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