Dr. Robinhsinkuo Chao
Metrology Development Engineer at IBM Corp
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | September 5, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Mathematical modeling, Metrology, Data modeling, Scanning electron microscopy, Transmission electron microscopy, Scatterometry, Machine learning, Field effect transistors, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Semiconductors, Metrology, Etching, Gallium arsenide, Silicon, Measurement devices, Geometrical optics, X-ray fluorescence spectroscopy, Nanolithography

PROCEEDINGS ARTICLE | April 12, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Metrology, Metals, X-rays, Copper, Resistance, Scatterometry, Process control, Machine learning, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 31, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Diffractive optical elements, Etching, Germanium, X-ray diffraction, Gallium arsenide, Silicon, Materials processing, Solids, Semiconducting wafers, X-ray fluorescence spectroscopy

PROCEEDINGS ARTICLE | March 30, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical lithography, Diffractive optical elements, Etching, Transmission electron microscopy, Scatterometry, Process control, Critical dimension metrology, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Multilayers, Metrology, Optical lithography, Metals, Germanium, Gallium arsenide, Silicon, Scatterometry, Semiconducting wafers, Nanowires

Showing 5 of 11 publications
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