Dr. Roderick Köhle
Staff Engineer at Qimonda AG
SPIE Involvement:
Publications (20)

Proceedings Article | 1 April 2008 Paper
Christoph Noelscher, Thomas Henkel, Franck Jauzion-Graverolle, Mario Hennig, Nicolo Morgana, Ralph Schlief, Molela Moukara, Roderick Koehle, Ralf Neubauer
Proceedings Volume 6924, 692446 (2008) https://doi.org/10.1117/12.772806
KEYWORDS: Photomasks, Optical proximity correction, Etching, Atrial fibrillation, Printing, Calibration, 3D modeling, 193nm lithography, Lithography, Mask making

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67301W (2007) https://doi.org/10.1117/12.746392
KEYWORDS: Finite element methods, Photomasks, Computer simulations, Critical dimension metrology, Near field, Chemical elements, Light scattering, Chromium, Optical lithography, Electromagnetism

Proceedings Article | 18 June 2007 Paper
Proceedings Volume 6617, 66170V (2007) https://doi.org/10.1117/12.726236
KEYWORDS: Etching, Diffraction, Finite element methods, Photomasks, Computer simulations, Chemical elements, Electromagnetism, Optical lithography, Nanostructures, Radio propagation

Proceedings Article | 15 May 2007 Paper
Proceedings Volume 6607, 66072Z (2007) https://doi.org/10.1117/12.729018
KEYWORDS: Photomasks, Diffraction, Polarization, Diffraction gratings, Phase shifting, Lithography, Scattering, Transparency, Optical proximity correction, Lithographic illumination

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63494Z (2006) https://doi.org/10.1117/12.687816
KEYWORDS: Finite element methods, Chemical elements, Photomasks, Computer simulations, Lithography, Image processing, Diffraction, Polarization, Airborne remote sensing, Photoresist processing

Showing 5 of 20 publications
Conference Committee Involvement (2)
Modeling Aspects in Optical Metrology
15 June 2009 | Munich, Germany
Modeling Aspects in Optical Metrology
18 June 2007 | Munich, Germany
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