Dr. Roel Gronheid
Senior Scientist at KLA-Tencor/ ICOS Belgium
SPIE Involvement:
Conference Co-Chair | Conference Program Committee | Journal Editorial Board Member | Author | Editor | Instructor
Publications (117)

SPIE Journal Paper | August 21, 2017
JM3 Vol. 16 Issue 03
KEYWORDS: Directed self assembly, System on a chip, Picosecond phenomena, Polymethylmethacrylate, Optical lithography, Scanning electron microscopy, Polymers, Annealing, Semiconducting wafers, Lithography

SPIE Journal Paper | June 14, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Directed self assembly, Optical lithography, Immersion lithography, Photomasks, Integrated circuits, Lithography, Logic, Semiconducting wafers, Optical design, Optical proximity correction

SPIE Conference Volume | May 2, 2017

SPIE Journal Paper | April 11, 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Directed self assembly, Line edge roughness, Line width roughness, Lithography, Metrology, Scanning electron microscopy, Silicon, Critical dimension metrology, Image segmentation, Picosecond phenomena

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Statistical analysis, Image segmentation, Manufacturing, Scanning electron microscopy, Process control, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Polymers, Annealing, Coating, Scanning electron microscopy, Directed self assembly, Picosecond phenomena, Thin film coatings, Semiconducting wafers, System on a chip

Showing 5 of 117 publications
Conference Committee Involvement (9)
Advances in Patterning Materials and Processes XXXV
26 February 2018 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
28 February 2017 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIII
29 February 2016 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXII
24 February 2015 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXI
24 February 2014 | San Jose, California, United States
Showing 5 of 9 published special sections
Course Instructor
SC1067: Directed Self Assembly and its Application to Nanoscale Fabrication
This course explains basic principles and applications of directed self assembly (DSA), with particular emphasis on block copolymer directed self assembly. A primary goal of the course is to present in a systematic manner the central issues that govern directed self assembly, and to do so in a way that will enable current and future practicioners of directed self assembly to rapidly identify the potential and limitations of this technique for specific applications. Anyone who wants to answer questions such as, "what structures can I create, how robust are certain processes, or what materials should I employ" will benefit from taking this course.
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