Dr. Roel Gronheid
Senior Scientist at KLA Corp
SPIE Involvement:
Conference Program Committee | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author | Editor | Instructor
Publications (135)

Proceedings Article | 21 November 2023 Presentation + Paper
Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Chang-Min Park, Kyoil Koo, Seongtae Jeong, John Biafore, Mark Smith, Trey Graves, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Kunlun Bai, Janez Krek, Craig Higgins, Sergei Bakarian, Kyeongeun Ko, Roel Gronheid, Kaushik Sah, Andrew Cross, Yi Liu, Alessandro Vaglio Pret, Chris Walker, Vikram Tolani, George Hwa, Peter Hu, Chang Song, Alex Arkhipov, Loemba Bouckou, Chi-Ping Liu, Xiaochun Yang, Kana O'Hara, Donghwan Son
Proceedings Volume 12750, 127500C (2023) https://doi.org/10.1117/12.2687373
KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Printing, Semiconducting wafers, Photoresist materials, Extreme ultraviolet lithography, Statistical analysis, Physical phenomena

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275007 (2023) https://doi.org/10.1117/12.2687702
KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Photomasks, Printing, Lithography, Source mask optimization, Simulations, Photons, Deep ultraviolet, Critical dimension metrology

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940O (2023) https://doi.org/10.1117/12.2658394
KEYWORDS: SRAF, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Stochastic processes, Manufacturing, Simulations

Proceedings Article | 27 April 2023 Presentation + Paper
Proceedings Volume 12496, 124960P (2023) https://doi.org/10.1117/12.2658042
KEYWORDS: Etching, Line edge roughness, Semiconducting wafers, Overlay metrology, 3D modeling, Scanning electron microscopy, Logic, Yield improvement, Optical lithography

Proceedings Article | 1 December 2022 Paper
Proceedings Volume 12293, 122930V (2022) https://doi.org/10.1117/12.2642695
KEYWORDS: Photomasks, SRAF, Source mask optimization, Stochastic processes, Extreme ultraviolet lithography, Extreme ultraviolet, Nanolithography