Dr. Roel Gronheid
Senior Scientist at ICOS VISION SYSTEMS NV
SPIE Involvement:
Conference Chair | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editor | Author | Instructor
Publications (124)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Calibration, Scanning electron microscopy, Optical calibration, Overlay metrology

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Logic, Optical parametric oscillators, Polarization, Etching, 3D metrology, Extreme ultraviolet, Optical alignment, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 10 October 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Overlay metrology, Semiconducting wafers, Metals, Etching, Scanners, Optical filters, Extreme ultraviolet lithography, Data modeling, Metrology, Scanning electron microscopy

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Optical filters, Metrology, Etching, Metals, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 8 January 2019
JM3 Vol. 18 Issue 01
KEYWORDS: Optical lithography, Extreme ultraviolet, High volume manufacturing, Extreme ultraviolet lithography, Lithography, Photomasks, Roads, Photoresist technology, Plasma etching, Image processing

Showing 5 of 124 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 14 May 2020

SPIE Conference Volume | 17 June 2019

SPIE Conference Volume | 23 May 2018

SPIE Conference Volume | 2 May 2017

Conference Committee Involvement (12)
Advances in Patterning Materials and Processes XXXVIII
21 February 2021 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXV
27 February 2018 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIV
28 February 2017 | San Jose, California, United States
Showing 5 of 12 Conference Committees
Course Instructor
SC1067: Directed Self Assembly and its Application to Nanoscale Fabrication
This course explains basic principles and applications of directed self assembly (DSA), with particular emphasis on block copolymer directed self assembly. A primary goal of the course is to present in a systematic manner the central issues that govern directed self assembly, and to do so in a way that will enable current and future practicioners of directed self assembly to rapidly identify the potential and limitations of this technique for specific applications. Anyone who wants to answer questions such as, "what structures can I create, how robust are certain processes, or what materials should I employ" will benefit from taking this course.
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