Dr. Roger T. Bonnecaze
at SandBox Semiconductor
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 25 March 2020 Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: Semiconductors, Calibration, Etching, Argon, Silicon, Plasma etching, Critical dimension metrology, Optimization (mathematics), System on a chip, Model-based design

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11329, Advanced Etch Technology for Nanopatterning IX
KEYWORDS: 3D acquisition, Visual process modeling, Data modeling, Calibration, Etching, Silicon, 3D modeling, Model-based design, Process modeling, Solid modeling

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Data modeling, Calibration, Etching, Neural networks, Cadmium sulfide, Plasma etching, Critical dimension metrology, Semiconducting wafers, Process modeling, Plasma

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Amorphous silicon, Analytics, Data modeling, Calibration, Etching, Manufacturing, Plasma etching, Reactive ion etching, Plasma

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10589, Advanced Etch Technology for Nanopatterning VII
KEYWORDS: Etching, Argon, Chemical species, Ions, Silicon, Surface roughness, Chlorine, Focus stacking software, Plasma

Showing 5 of 16 publications
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